Search Results - "FORSTER, JOHN S" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

DISK FILE WITH LIQUID FILM HEAD-DISK INTERFACE

DISK FILE WITH LIQUID FILM HEAD-DISK INTERFACE

by ALBRECHT, THOMAS R, HOMOLA, ANDREW M, FORSTER, JOHN S
Year of Publication 21.04.1995

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Patent

Separable fastener

Separable fastener

by FORSTER JOHN S
Year of Publication 16.06.1936

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Patent

Dispensing container

Dispensing container

by FORSTER JOHN S
Year of Publication 11.02.1936

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Patent

GYROSCOPE

GYROSCOPE

by SEYMOUR W. HERWALD, JOHN S. FORSTER
Year of Publication 17.07.1945

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Patent

Gyroscope

Gyroscope

by HERWALD SEYMOUR W, FORSTER JOHN S
Year of Publication 27.07.1943

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Patent

Variable speed friction drive

Variable speed friction drive

by HERWALD SEYMOUR W, FORSTER JOHN S
Year of Publication 03.02.1942

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Patent

Selective obfuscation of notifications

Selective obfuscation of notifications

by SHARIFI MOSTAFA, FORSTER JOHN
Year of Publication 04.08.2023

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Patent

Fabric structure with flexible solar cells

Fabric structure with flexible solar cells

by BRYMERSKI WOJCIECH, FORSTER JOHN
Year of Publication 14.07.2023

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Patent

Nanopore cell with seamless working electrode and method of forming same

Nanopore cell with seamless working electrode and method of forming same

by HONER KENNETH A, WU MELODY, FORSTER JOHN C
Year of Publication 03.02.2023

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Patent

High temperature removable ultrahigh frequency (VHF) electrostatic chuck (ESC) for pvd chamber

High temperature removable ultrahigh frequency (VHF) electrostatic chuck (ESC) for pvd chamber

by JOHNSON WILLIAM R, MILLER KEITH A, SUNDARRAJAN, MUKUND, TSAI CHENG-HSIUNG MATTHEW, FORSTER JOHN C
Year of Publication 28.06.2024

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Patent

PVD 챔버를 위한 고온 탈착가능 초고주파(VHF) 정전 척(ESC)

PVD 챔버를 위한 고온 탈착가능 초고주파(VHF) 정전 척(ESC)

by SUNDARARAJAN MUKUND, TSAI CHENG HSIUNG MATTHEW, MILLER KEITH A, JOHANSON WILLIAM R, FORSTER JOHN C
Year of Publication 24.06.2024

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Patent

High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber

High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber

by JOHANSON, WILLIAM R, MILLER, KEITH A, FORSTER, JOHN C, SUNDARARAJAN, MUKUND, TSAI, CHENG-HSIUNG MATTHEW
Year of Publication 01.06.2023

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Patent

Smart dynamic load simulator for RF power delivery control system

Smart dynamic load simulator for RF power delivery control system

by ZHENG, RONG GANG, FORSTER, JOHN, RAUF, SHAHID, ZHANG, TAO, BHATIA, SIDHARTH, GUO, YUE, YU, JIE, RAMASWAMY, KARTIK
Year of Publication 16.04.2024

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Patent

Passive temperature controlled packaging system as containerized equipment

Passive temperature controlled packaging system as containerized equipment

by VAN DER PLAS BENJAMIN GERARD, AHMED IFTEKHAR, DEGERO BRADLEY MORRISON, FORSTER JOHN
Year of Publication 02.05.2023

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Patent

Low diacetyl yeast

Low diacetyl yeast

by GJERMANSEN CARSTEN, FORSTER JOHN, LANGLER KONRAD, CHAILIANG ANGELA, KATZ MARTIN, FENNESSEY RICHARD
Year of Publication 21.04.2023

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Patent

Rotary electrical feedthrough integration for process chamber

Rotary electrical feedthrough integration for process chamber

by GANTA, SATHYA SWAROOP, GUO, YANG, FORSTER, JOHN, SUBRAMANI, ANANTHA, CHAN, ANTHONY, HARRELSON, WADE, MURTAGH, MIKE, TOMKO, ANDREW, BALUJA, SANJEEV
Year of Publication 01.02.2024

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Patent

Plasma source for rotating platen ALD chambers

Plasma source for rotating platen ALD chambers

by YUDOVSKY JOSEPH, FORSTER JOHN C
Year of Publication 19.09.2017

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Patent

SHAPED ELECTRODES FOR IMPROVED PLASMA EXPOSURE FROM VERTICAL PLASMA SOURCE

SHAPED ELECTRODES FOR IMPROVED PLASMA EXPOSURE FROM VERTICAL PLASMA SOURCE

by DZILNO DMITRY A, SUBRAMANI ANANTHA K, TANAKA TSUTOMU, BERA KALLOL, FORSTER JOHN C
Year of Publication 30.08.2022

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Patent

PLASMA SOURCE ASSEMBLY, PROCESSING CHAMBER,AND METHOD TO GENERATE PIE SHAPED TREATMENT

PLASMA SOURCE ASSEMBLY, PROCESSING CHAMBER,AND METHOD TO GENERATE PIE SHAPED TREATMENT

by HOUSHMAND, FARZAD, SUBRAMANI, ANANTHA K, FORSTER, JOHN C, KRAUS, PHILIP A, BERA, KALLOL, CHOWDHURY, ABHISHEK
Year of Publication 11.08.2022

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Patent

ELONGATED CAPACITIVELY COUPLED PLASMA SOURCE FOR HIGH TEMPERATURE LOW PRESSURE ENVIRONMENTS

ELONGATED CAPACITIVELY COUPLED PLASMA SOURCE FOR HIGH TEMPERATURE LOW PRESSURE ENVIRONMENTS

by NGO, TAI T, KWONG, GARRY K, GRIFFIN, KEVIN, COLLINS, KENNETH S, LIU, REN, FORSTER, JOHN C, YUDOVSKY, JOSEPH
Year of Publication 01.07.2022

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Patent

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