Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide
Kukli, Kaupo, Forsgren, Katarina, Aarik, Jaan, Uustare, Teet, Aidla, Aleks, Niskanen, Antti, Ritala, Mikko, Leskelä, Markku, Hårsta, Anders
Published in Journal of crystal growth (01.09.2001)
Published in Journal of crystal growth (01.09.2001)
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Journal Article
Influence of thickness and growth temperature on the properties of zirconium oxide films grown by atomic layer deposition on silicon
Kukli, Kaupo, Ritala, Mikko, Uustare, Teet, Aarik, Jaan, Forsgren, Katarina, Sajavaara, Timo, Leskelä, Markku, Hårsta, Anders
Published in Thin solid films (01.05.2002)
Published in Thin solid films (01.05.2002)
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Journal Article
Deposition of HfO2 thin films in HfI4-based processes
FORSGREN, Katarina, HARSTA, Anders, AARIK, Jaan, AIDLA, Aleks, WESTLINDER, Jörgen, OLSSON, Jörgen
Published in Journal of the Electrochemical Society (01.10.2002)
Published in Journal of the Electrochemical Society (01.10.2002)
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Journal Article
Atomic Layer Deposition of Tantalum Oxide Thin Films from Iodide Precursor
Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Forsgren, Katarina, Sundqvist, Jonas, Hårsta, Anders, Uustare, Teet, Mändar, Hugo, Kiisler, Alma-Asta
Published in Chemistry of materials (01.01.2001)
Published in Chemistry of materials (01.01.2001)
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Iodide-Based Atomic Layer Deposition of ZrO2: Aspects of Phase Stability and Dielectric Properties
Forsgren, K., Westlinder, J., Lu, J., Olsson, J., Hårsta, A.
Published in Chemical vapor deposition (03.05.2002)
Published in Chemical vapor deposition (03.05.2002)
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Journal Article