Doping profile measurement on textured silicon surface
Essa, Zahi, Taleb, Nadjib, Sermage, Bernard, Broussillou, Cédric, Bazer-Bachi, Barbara, Quillec, Maurice
Published in EPJ Photovoltaics (2018)
Published in EPJ Photovoltaics (2018)
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Journal Article
Kinetic Monte Carlo simulations of boron activation in implanted Si under laser thermal annealing
Fisicaro, Giuseppe, Pelaz, Lourdes, Aboy, Maria, Lopez, Pedro, Italia, Markus, Huet, Karim, Cristiano, Filadelfo, Essa, Zahi, Yang, Qui, Bedel-Pereira, Elena, Quillec, Maurice, La Magna, Antonino
Published in Applied physics express (01.02.2014)
Published in Applied physics express (01.02.2014)
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Journal Article
Modeling boron dose loss in sidewall spacer stacks of complementary metal oxide semiconductor transistors
Essa, Z., Pelletier, B., Morin, P., Boulenc, P., Pakfar, A., Tavernier, C., Wacquant, F., Zechner, C., Juhel, M., Autran, J.L., Cristiano, F.
Published in Solid-state electronics (01.12.2016)
Published in Solid-state electronics (01.12.2016)
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Journal Article
Observation of point defect injection from electrical deactivation of arsenic ultra-shallow distributions formed by ultra-low energy ion implantation and laser sub-melt annealing
Demenev, Evgeny, Meirer, Florian, Essa, Zahi, Giubertoni, Damiano, Cristiano, Fuccio, Pepponi, Giancarlo, Gennaro, Salvatore, Bersani, Massimo, Foad, Majeed A.
Published in Physica status solidi. C (01.01.2014)
Published in Physica status solidi. C (01.01.2014)
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Journal Article
Implantation-induced structural defects in highly activated USJs: Boron precipitation and trapping in pre-amorphised silicon
Cristiano, F., Essa, Z., Qiu, Y., Spiegel, Y., Torregrosa, F., Duchaine, J., Boulenc, P., Tavernier, C., Cojocaru, O., Blavette, D., Mangelinck, D., Fazzini, P. F., Quillec, M., Bazizi, M., Hackenberg, M., Boninelli, S.
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
Published in 2012 12th International Workshop on Junction Technology (01.05.2012)
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