Process Parameter Control for BEOL TiN Hard Mask Etch-Back
Engesser, Philipp, Linder, Manuel, Hofer-Moser, Jörg, Okorn-Schmidt, Harald
Published in Solid state phenomena (01.08.2018)
Published in Solid state phenomena (01.08.2018)
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Journal Article
Surface Cleaning of SiGe(100) and Passivation of Ge(100) with Aqeuous Ammonium Sulfide
Heslop, Stacy Lynn, Engesser, Philipp, Okorn-Schmidt, Harald F., Muscat, Anthony J.
Published in ECS transactions (11.09.2015)
Published in ECS transactions (11.09.2015)
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Journal Article
WET-DRY INTEGRATED WAFER PROCESSING SYSTEM
OKORN-SCHMIDT HARALD, MYSLOVATY MICHAEL, BJORK ANDERS JOEL, LILL THORSTEN, FISCHER ANDREAS, GOULD RICHARD H, ENGESSER PHILIPP
Year of Publication 27.09.2017
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Year of Publication 27.09.2017
Patent
Method and device for plating a recess in a substrate
Gleissner, Andreas, Markut, Franz, Engesser, Philipp, Wirnsberger, Thomas, Knoll, Oliver, Okorn-Schmidt, Harald
Year of Publication 20.02.2024
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Year of Publication 20.02.2024
Patent
METHOD FOR TREATING SUBSTRATES WITH CHEMICALS
SMOLINER, Klaus, LINDER, Manuel, ENGESSER, Philipp, Tobias, OKORN-SCHMIDT, Harald, HOFER-MOSER, Jörg
Year of Publication 25.01.2023
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Year of Publication 25.01.2023
Patent