Process Variability-Technological Challenge and Design Issue for Nanoscale Devices
Lorenz, Jürgen, Bär, Eberhard, Barraud, Sylvain, Brown, Andrew R, Evanschitzky, Peter, Klüpfel, Fabian, Wang, Liping
Published in Micromachines (Basel) (01.01.2019)
Published in Micromachines (Basel) (01.01.2019)
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Journal Article
Simulation of proximity and contact lithography
Meliorisz, Bálint, Evanschitzky, Peter, Erdmann, Andreas
Published in Microelectronic engineering (01.05.2007)
Published in Microelectronic engineering (01.05.2007)
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Journal Article
Conference Proceeding
Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
Erdmann, Andreas, Xu, Dongbo, Evanschitzky, Peter, Philipsen, Vicky, Luong, Vu, Hendrickx, Eric
Published in Advanced optical technologies (27.06.2017)
Published in Advanced optical technologies (27.06.2017)
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Journal Article
Optical and EUV projection lithography: A computational view
Erdmann, Andreas, Fühner, Tim, Evanschitzky, Peter, Agudelo, Viviana, Freund, Christian, Michalak, Przemyslaw, Xu, Dongbo
Published in Microelectronic engineering (25.01.2015)
Published in Microelectronic engineering (25.01.2015)
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Journal Article
Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
Erdmann, Andreas, Shao, Feng, Agudelo, Viviana, Fühner, Tim, Evanschitzky, Peter
Published in Journal of modern optics (10.03.2011)
Published in Journal of modern optics (10.03.2011)
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Journal Article
Process informed accurate compact modelling of 14-nm FinFET variability and application to statistical 6T-SRAM simulations
Xingsheng Wang, Reid, Dave, Liping Wang, Millar, Campbell, Burenkov, Alexander, Evanschitzky, Peter, Baer, Eberhard, Lorenz, Juergen, Asenov, Asen
Published in 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2016)
Published in 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) (01.09.2016)
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Conference Proceeding
Simulation of 3D inclined/rotated UV lithography and its application to microneedles
Liu, Shijie, Roeder, Georg, Aygun, Gulnur, Motzek, Kristian, Evanschitzky, Peter, Erdmann, Andreas
Published in Optik (Stuttgart) (01.05.2012)
Published in Optik (Stuttgart) (01.05.2012)
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Journal Article
Hierarchical Simulation of Process Variations and Their Impact on Circuits and Systems: Results
Lorenz, J. K., Bar, E., Clees, T., Evanschitzky, P., Jancke, R., Kampen, C., Paschen, U., Salzig, C. P. J., Selberherr, S.
Published in IEEE transactions on electron devices (01.08.2011)
Published in IEEE transactions on electron devices (01.08.2011)
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Journal Article
Rigorous diffraction simulations of topographic wafer stacks in double patterning
Shao, Feng, Evanschitzky, Peter, Fühner, Tim, Erdmann, Andreas
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Journal Article
Conference Proceeding
Hierarchical Simulation of Process Variations and Their Impact on Circuits and Systems: Results : CHARACTERIZATION OF NANO CMOS VARIABIALITY BY SIMULATION AND MEASUREMENTS
LORENZ, Jürgen K, BÄR, Eberhard, CLEES, Tanja, EVANSCHITZKY, Peter, JANCKE, Roland, KAMPEN, Christian, PASCHEN, Uwe, SALZIG, Christian P. J, SELBERHERR, Siegfried
Published in IEEE transactions on electron devices (2011)
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Published in IEEE transactions on electron devices (2011)
Journal Article
Mask and Wafer Topography Effects in Optical and EUV-Lithography
Erdmann, Andreas, Shao, Feng, Evanschitzky, Peter, Fühner, Tim
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
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Journal Article
Erosionsmessung an rauhen Oberflächen mittels Streifenkontrast in der Speckle- Interferometrie
Jakobi, Martin, Evanschitzky, Peter, Koch, Alexander W.
Published in Technisches Messen (01.04.1999)
Published in Technisches Messen (01.04.1999)
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Journal Article
Method for determining object surface structure whereby the object is simultaneously irradiated with light of at least two different wavelengths with the back-scattered radiation processed separately according to its wavelength
ZEH, THOMAS, KOCH, ALEXANDER W, RIEMENSCHNEIDER, MARKUS, EVANSCHITZKY, PETER
Year of Publication 14.11.2002
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Year of Publication 14.11.2002
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