Search Results - "EROKHIN YURI" :: K.UTB vyhledávací portál

PROCESS AND SYSTEM FOR UNIFORMLY CRYSTALLIZING AMORPHOUS SILICON SUBSTRATE BY FIBER LASER

by EROKHIN YURI, VON DADELSZEN MICHAEL, AVDOKHIN ALEXEY, LEONARDO MANUEL, SAMARTSEV IGOR, LIMANOV ALEXANDER
Year of Publication 14.01.2016

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Technique for forming a FinFET device using selective ion implantation

by EROKHIN YURI, GODET LUDOVIC, BRAND ADAM, HAUTALA JOHN J, NEMANI SRINIVAS
Year of Publication 17.11.2015

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TECHNIQUES FOR DEPOSITING METALLIC FILMS USING ION IMPLANTATION SURFACE MODIFICATION FOR CATALYSIS OF ELECTROLESS DEPOSITION

by EROKHIN YURI, NUNAN PETER D
Year of Publication 04.11.2008

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TECHNIQUES FOR DEPOSITING METALLIC FILMS USING ION IMPLANTATION SURFACE MODIFICATION FOR CATALYSIS OF ELECTROLESS DEPOSITION

by NUNAN, PETER, D, EROKHIN, YURI
Year of Publication 25.09.2008

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METHOD OF PRODUCING A HIGH RESISTIVITY SIMOX SILICON SUBSTRATE

by Kononchuk, Oleg, Erokhin, Yuri
Year of Publication 11.11.2004

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Internal gettering in SIMOX SOI silicon substrates

by EROKHIN YURI, DEMPSEY KEVIN J
Year of Publication 13.11.2007

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Internal gettering in SIMOX SOI silicon substrates

by Erokhin, Yuri, Dempsey, Kevin J
Year of Publication 13.11.2007

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TECHNIQUE FOR DEPOSITING METALLIC FILMS USING ION IMPLANTATION SURFACE MODIFICATION FOR CATALYSIS OF ELECTROLESS DEPOSITION

by EROKHIN YURI, NUNAN PETER D
Year of Publication 09.08.2007

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DOPING OF PLANAR OR THREE-DIMENSIONAL STRUCTURES AT ELEVATED TEMPERATURES

by EROKHIN YURI, GOSSMAN HANS-JOACHIM LUDWIG, STEEN LOUIS
Year of Publication 31.05.2012

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DOPING OF PLANAR OR THREE-DIMENSIONAL STRUCTURES AT ELEVATED TEMPERATURES

by EROKHIN, YURI, STEEN, LOUIS, GOSSMAN, HANS-JOACHIM, L
Year of Publication 24.05.2012

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Method of producing a high resistivity SIMOX silicon substrate

by Erokhin, Yuri, Konochuk, Okeg V
Year of Publication 26.09.2006

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Method of producing a high resistivity SIMOX silicon substrate

by EROKHIN YURI, KONOCHUK OKEG V
Year of Publication 26.09.2006

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Active wafer cooling during damage engineering implant to enchance buried oxide formation in simox wafers

by Blake, Julian, Erokhin, Yuri
Year of Publication 08.05.2003

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NANO-CLEAVE A THIN-FILM OF SILICON FOR SOLAR CELL FABRICATION

by EROKHIN YURI, NUNAN PETER, WALTHER STEVEN R
Year of Publication 16.07.2009

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Technique For Forming A FinFET Device

by EROKHIN YURI, GODET LUDOVIC, BRAND ADAM, HAUTALA JOHN J, NEMANI SRINIVAS
Year of Publication 20.03.2014

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SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION

by EROKHIN YURI, BLAKE JULIAN, ENGLAND JONATHAN
Year of Publication 02.04.2009

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Active wafer cooling during damage engineering implant to enhance buried oxide formation in SIMOX wafers

by EROKHIN YURI, BLAKE JULIAN G
Year of Publication 14.02.2006

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Active wafer cooling during damage engineering implant to enhance buried oxide formation in SIMOX wafers

by Erokhin, Yuri, Blake, Julian G
Year of Publication 14.02.2006

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Wafer bonding activated by ion implantation

by Erokhin, Yuri, Sullivan, Paul, Walther, Steven R, Nunan, Peter
Year of Publication 10.05.2011

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Wafer bonding activated by ion implantation

by EROKHIN YURI, NUNAN PETER, SULLIVAN PAUL, WALTHER STEVEN R
Year of Publication 10.05.2011

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