VERFAHREN ZUR HERSTELLUNG VON NEUEN SILOXANMODIFIZIERTEN SULFOBETAINSULFONEN
ENGELBRECHT,LOTHAR,DE, SEIBT,HORST,DE, BALLSCHUH,DETLEF,DE, OHME,ROLAND,DE
Year of Publication 02.05.1991
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Year of Publication 02.05.1991
Patent
LICHTEMPFINDLICHES KOPIERMATERIAL
HAEHNEL,ELFRIEDE,DE, LEHMANN,LUKAS,DE, SEIBT,HORST,DE, ENGELBRECHT,LOTHAR,DE, PRESCHER,DIETRICH,DE, BARNIKOW,JOACHIM,DE, LEHMS,INGEBURG,DE, BAUMBACH,WOLFGANG,DE
Year of Publication 05.09.1991
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Year of Publication 05.09.1991
Patent
POSITIVRESIST
LEHMANN,LUKAS,DE, HAEHNEL,ELFRIEDE,DE, PLATONOV,VIATCHESLAV E.,SU, SEIBT,HORST,DE, ENGELBRECHT,LOTHAR,DE, PRESCHER,DIETRICH,DE, BARNIKOW,JOACHIM,DE, LEHMS,INGEBURG,DE, BAUMBACH,WOLFGANG,DE
Year of Publication 05.09.1991
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Year of Publication 05.09.1991
Patent
New 3-substd. 4-sulpho-methyl-pyrrolidinium betaine cpds. - contg. 2-silyl:alkylamino-propyl:sulphonyl-methyl gp. useful as biocides surfactants, etc
SEIBT, HORST., O-1155 BERLIN, DE, OHME, ROLAND., O-1180 BERLIN, DE, ENGELBRECHT, LOTHAR., O-1130 BERLIN, DE, BALLSCHUH, DETLEF., O-1185 BERLIN, DE
Year of Publication 08.07.1993
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Year of Publication 08.07.1993
Patent
Hydrophilicising agent
SEIBT, HORST., 10407 BERLIN, DE, ENGELBRECHT, LOTHAR., 10365 BERLIN, DE, SCHMIDT, BURKHARD., 14727 PREMNITZ, DE, OHME, ROLAND., 12526 BERLIN, DE, BALLSCHUH, DETLEF., 12524 BERLIN, DE, ELLMANN, RITA., 14727 PREMNITZ, DE, SCHOENING, KLAUS-JUERGEN., 14712 RATHENOW, DE
Year of Publication 08.12.1994
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Year of Publication 08.12.1994
Patent
Hydrophilic synthetic reinforcement and process fibres with affinity for silicate
SEIBT, HORST., 10407 BERLIN, DE, ENGELBRECHT, LOTHAR., 10365 BERLIN, DE, SCHMIDT, BURKHARD., 14727 PREMNITZ, DE, OHME, ROLAND., 12526 BERLIN, DE, BALLSCHUH, DETLEF., 12524 BERLIN, DE, ELLMANN, RITA., 14727 PREMNITZ, DE, SCHOENING, KLAUS-JUERGEN., 14712 RATHENOW, DE
Year of Publication 18.08.1994
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Year of Publication 18.08.1994
Patent
Positive photoresist soln. contg. siloxane with fluoroalkyl gps. - use to reduce surface roughness of coating, useful for structurising microelectronic device
BAUMBACH, WOLFGANG, O-1058 BERLIN, DE, HAEHNEL, ELFRIEDE, O-1197 BERLIN, DE, PRESCHER, DIETRICH., O-1193 BERLIN, DE, LEHMANN, LUKAS, O-1055 BERLIN, DE, ENGELBRECHT, LOTHAR., O-1130 BERLIN, DE, BARNIKOW, JOACHIM, O-1170 BERLIN, DE, SEIBT, HORST, LEHMS, INGEBURG, O-8010 DRESDEN, DE, PLATANOW, V. E., NOVOSIBIRSK, SU
Year of Publication 17.10.1991
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Year of Publication 17.10.1991
Patent
Photoresist soln. contg. acyclic or cyclic siloxane] cpd. - to reduce surface roughness of coating, useful for structurising microelectronic device
BAUMBACH, WOLFGANG, O-1058 BERLIN, DE, HAEHNEL, ELFRIEDE, O-1197 BERLIN, DE, SEIBT, HORST., O-1055 BERLIN, DE, PRESCHER, DIETRICH., O-1193 BERLIN, DE, ENGELBRECHT, LOTHAR., O-1130 BERLIN, DE, LEHMANN, LUKAS, O-1055 BERLIN, DE, BARNIKOW, JOACHIM, O-1170 BERLIN, DE, LEHMS, INGEBURG, O-8010 DRESDEN, DE
Year of Publication 17.10.1991
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Year of Publication 17.10.1991
Patent
Photostatic lacquer soln. - contains ether cpd. contg. fluorinated alkyl gp. and siloxanyl gp., useful for microelectronic components
BAUMBACH, WOLFGANG, O-1058 BERLIN, DE, HAEHNEL, ELFRIEDE, O-1197 BERLIN, DE, SEIBT, HORST., O-1055 BERLIN, DE, PRESCHER, DIETRICH., O-1193 BERLIN, DE, ENGELBRECHT, LOTHAR., O-1130 BERLIN, DE, LEHMANN, LUKAS, O-1055 BERLIN, DE, BARNIKOW, JOACHIM, O-1170 BERLIN, DE, LEHMS, INGEBURG, O-8010 DRESDEN, DE
Year of Publication 17.10.1991
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Year of Publication 17.10.1991
Patent