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"EJIRI HIROE"
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"EJIRI HIROE"
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PLASMA ELECTRODE, PLASMA PROCESSING ELECTRODE, CVD ELECTRODE, PLASMA CVD DEVICE, AND METHOD FOR MANUFACTURING SUBSTRATE WITH THIN FILM
by
KAWASHITA MAMORU
,
EJIRI HIROE
Year of Publication
26.07.2016
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PLASMA ELECTRODE, PLASMA PROCESSING ELECTRODE, CVD ELECTRODE, PLASMA CVD DEVICE, AND METHOD FOR MANUFACTURING SUBSTRATE WITH THIN FILM
by
KAWASHITA, MAMORU
,
EJIRI
,
HIROE
Year of Publication
28.05.2015
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PLASMA CVD DEVICE AND PLASMA CVD METHOD
by
EJIRI HIROE
,
SAKAMOTO KEITARO
,
TONAI SHUNPEI
,
NOMURA FUMIYASU
Year of Publication
23.11.2015
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PLASMA CVD DEVICE AND PLASMA CVD METHOD
by
SAKAMOTO, KEITARO
,
TONAI, SHUNPEI
,
NOMURA, FUMIYASU
,
EJIRI
,
HIROE
Year of Publication
18.09.2014
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PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD
by
EJIRI HIROE
,
UEDA MASANORI
,
SAKAMOTO KEITARO
,
NOMURA FUMIYASU
Year of Publication
10.04.2014
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MAGNETRON ELECTRODE FOR PLASMA PROCESSING
by
KAWASHITA MAMORU
,
EJIRI HIROE
,
UEDA MASANORI
,
NOMURA FUMIYASU
Year of Publication
06.01.2014
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PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD
by
SAKAMOTO, KEITARO
,
NOMURA, FUMIYASU
,
UEDA, MASANORI
,
EJIRI
,
HIROE
Year of Publication
04.10.2012
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MAGNETRON ELECTRODE FOR PLASMA PROCESSING
by
NOMURA, FUMIYASU
,
UEDA, MASANORI
,
KAWASHITA, MAMORU
,
EJIRI
,
HIROE
Year of Publication
30.08.2012
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PLASMA CVD DEVICE AND METHOD FOR MANUFACTURING A SUBSTRATE WITH A THIN FILM
by
EJIRI
,
Hiroe
,
KAWASHITA, Mamoru
Year of Publication
23.09.2020
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PLASMA ELECTRODE, PLASMA PROCESSING ELECTRODE, CVD ELECTRODE, PLASMA CVD DEVICE, AND METHOD FOR MANUFACTURING SUBSTRATE WITH THIN FILM
by
EJIRI
,
Hiroe
,
KAWASHITA, Mamoru
Year of Publication
19.04.2017
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PLASMA ELECTRODE, PLASMA PROCESSING ELECTRODE, CVD ELECTRODE, PLASMA CVD DEVICE, AND METHOD FOR MANUFACTURING SUBSTRATE WITH THIN FILM
by
Kawashita Mamoru
,
Ejiri Hiroe
Year of Publication
13.10.2016
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PLASMA ELECTRODE, PLASMA PROCESSING ELECTRODE, CVD ELECTRODE, PLASMA CVD DEVICE, AND METHOD FOR MANUFACTURING SUBSTRATE WITH THIN FILM
by
KAWASHITA, MAMORU
,
EJIRI
,
HIROE
Year of Publication
28.09.2016
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PLASMA CVD DEVICE AND PLASMA CVD METHOD
by
SAKAMOTO, KEITARO
,
TONAI, SHUNPEI
,
NOMURA, FUMIYASU
,
EJIRI
,
HIROE
Year of Publication
26.02.2021
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PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD
by
FUMIYASU NOMURA
,
MASANORI UEDA
,
KEITARO SAKAMOTO
,
HIROE EJIRI
Year of Publication
18.01.2021
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PLASMA CVD APPARATUS AND PLASMA CVD METHOD
by
EJIRI
,
Hiroe
,
UEDA, Masanori
,
NOMURA, Fumiyasu
,
SAKAMOTO, Keitaro
Year of Publication
25.03.2020
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MAGNETRON ELECTRODE FOR PLASMA PROCESSING
by
FUMIYASU NOMURA
,
MAMORU KAWASHITA
,
MASANORI UEDA
,
HIROE EJIRI
Year of Publication
30.08.2019
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PLASMA CVD DEVICE AND PLASMA CVD METHOD
by
EJIRI
,
Hiroe
,
TONAI, Shunpei
,
NOMURA, Fumiyasu
,
SAKAMOTO, Keitaro
Year of Publication
24.10.2018
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MAGNETRON ELECTRODE FOR PLASMA PROCESSING
by
EJIRI
,
Hiroe
,
KAWASHITA, Mamoru
,
UEDA, Masanori
,
NOMURA, Fumiyasu
Year of Publication
08.03.2017
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PLASMA CVD DEVICE AND PLASMA CVD METHOD
by
SAKAMOTO, KEITARO
,
TONAI, SHUNPEI
,
NOMURA, FUMIYASU
,
EJIRI
,
HIROE
Year of Publication
23.11.2016
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Plasma electrode, plasma processing electrode, cvd electrode, plasma cvd device, and method for manufacturing substrate with thin film
by
KAWASHITA MAMORU
,
EJIRI HIROE
Year of Publication
08.06.2016
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