Search Results - "EHM DIRK HEINRICH" :: K.UTB vyhledávací portál

ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT

by BANINE VADIM YEVGENYEVICH, EHM DIRK HEINRICH, KAMPEN MAARTEN VAN, LOOPSTRA ERIK, SCHMIDT STEFAN-WOLFGANG
Year of Publication 28.03.2013

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OPTICAL ELEMENT WITH AT LEAST ONE ELECTRICALLY CONDUCTIVE REGION, AND ILLUMINATION SYSTEM WITH THE OPTICAL ELEMENT

by WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, WARM BERNDT
Year of Publication 16.09.2010

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Mirror for guiding a radiation bundle

by BACH FLORIAN, NOELL WILFRIED, EHM DIRK HEINRICH, KRAUS DIETER, WIESNER STEFAN, WALDIS SEVERIN, BENZ DANIEL, WERBER ARMIN
Year of Publication 06.05.2014

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Generator for atomic hydrogen, comprises container with gas inlet to introduce molecular hydrogen and gas outlet, UV-radiation source arranged outside of the container, so that UV-radiation penetrates into container interior, and mirror

by FISCHER, HOLGER, SCHMIDT, STEFAN-WOLFGANG, EHM, DIRK HEINRICH
Year of Publication 22.07.2010

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EUV LITHOGRAPHY SYSTEM AND CABLE FOR THE SAME

by SCHMIDT, STEFAN-WOLFGANG, HOLGER, FISCHER, EHM, DIRK, HEINRICH, KRAUS, DIETER
Year of Publication 22.07.2010

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ILLUMINATION SYSTEM OPTICAL ELEMENT WITH AN ELECTRICALLY CONDUCTIVE REGION

by WOLSCHRIJN, BASTIAAN, THEODOOR, EHM, DIRK, HEINRICH, WARM, BERNDT
Year of Publication 07.07.2010

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Projection objective of a microlithographic projection exposure apparatus

by EHM DIRK HEINRICH, KAMENOV VLADIMIR, LOERING ULRICH, BECKER MORITZ, WURMBRAND ANDREAS, SCHMIDT STEFAN-WOLFGANG
Year of Publication 25.12.2012

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Projection objective of a microlithographic projection exposure apparatus

by Loering, Ulrich, Kamenov, Vladimir, Ehm, Dirk Heinrich, Schmidt, Stefan-Wolfgang, Becker, Moritz, Wurmbrand, Andreas
Year of Publication 25.12.2012

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Extreme UV mirror for use in extreme UV-projection exposure system of illumination system for microlithography for manufacturing e.g. microstructured components, has absorber layer arranged between cover layer and mirror layer

by HUBER, PETER, EHM, DIRK HEINRICH, ZACZEK, CHRISTOPH
Year of Publication 21.08.2014

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PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

by EHM DIRK HEINRICH, KAMENOV VLADIMIR, LOERING ULRICH, BECKER MORITZ, WURMBRAND ANDREAS, SCHMIDT STEFAN-WOLFGANG
Year of Publication 08.11.2012

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Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus

by EHM DIRK HEINRICH, BLANCKENHAGEN GISELA VON
Year of Publication 16.07.2014

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Euv lithography system and operating method therefor

by OSORIO, EDGAR, SCHMIDT, STEFAN-WOLFGANG, TE SLIGTE, EDWIN, LOGTENBERG, HELLA, ZELLENRATH, MARK, EHM, DIRK HEINRICH
Year of Publication 11.06.2019

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Method for removing contamination on optical surfaces and optical arrangement

by WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MOORS JOHANNES HUBERTUS JOSEPHINA, BANINE VADIM, IVANOV VLADIMIR VITALEVITSCH
Year of Publication 02.10.2012

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Method for removing contamination on optical surfaces and optical arrangement

by Ehm, Dirk Heinrich, Moors, Johannes Hubertus Josephina, Wolschrijn, Bastiaan Theodoor, Banine, Vadim, Ivanov, Vladimir Vitalevitsch
Year of Publication 02.10.2012

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