Search Results - "EHM DIRK HEINRICH" :: K.UTB vyhledávací portál

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EUV LITHOGRAPHY SYSTEM

by EHM, Dirk Heinrich, AMENT, Irene, SHKLOVER, Vitaliy
Year of Publication 16.02.2017

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VERFAHREN ZUR AUFARBEITUNG REFLEKTIVER OPTISCHER ELEMENTE FÜR ULTRAVIOLETTE STRAHLUNG ODER WEICHE RÖNTGENSTRAHLUNG

by Ament, Irene, Ehm, Dirk Heinrich, Eckhoff, Roger
Year of Publication 12.01.2017

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OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION

by SCHMIDT, STEFAN-WOLFGANG, WALTER, MARKUS, EHM, DIRK HEINRICH
Year of Publication 24.01.2013

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Abschirmvorrichtung für eine Projektionsbelichtungsanlage und Betriebsverfahren hierzu

by EHM, DIRK HEINRICH, AMENT, IRENE
Year of Publication 20.11.2014

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Extreme UV imaging device e.g. extreme UV lithography system, for manufacturing integrated circuits, has sensor device detecting measuring variable and formed as fiber Bragg lattice sensor

by VERBERK, ROGIER, BODIS, PAVOL, EHM, DIRK HEINRICH, CHEN, LUN-KAI
Year of Publication 20.12.2012

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SURFACE CORRECTION ON COATED MIRRORS

by EHM DIRK HEINRICH, STICKEL FRANZ-JOSEF, MUELLER JUERGEN
Year of Publication 29.11.2012

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REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

by MUELLENDER, STEPHAN, HUBER, PETER, EHM, DIRK HEINRICH, BLANCKENHAGEN, GISELA VON
Year of Publication 22.11.2012

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Collector used in projection exposure system, for aligning extreme UV (EUV) radiation of EUV laser plasma source, has sub unit whose passage opening feeds material from plasma source feed device and adapts to scattering of trajectories

by BUTSCHER, VERA, BECKER, MORITZ, SCHMIDT, STEFAN-WOLFGANG, EHM, DIRK HEINRICH
Year of Publication 15.11.2012

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REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS

by VON BLANCKENHAGEN GISELA, EHM DIRK HEINRICH, DOCHNAHL AXEL
Year of Publication 04.10.2012

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Spiegeleinrichung für UV-Licht

by Becker, Moritz, Strobel, Sebastian, Ehm, Dirk Heinrich, Siekmann, Heiko
Year of Publication 24.05.2018

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OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY

by EHM DIRK HEINRICH, SCHMIDT STEFAN-WOLFGANG, DENGEL GUENTHER
Year of Publication 06.09.2012

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REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT

by EHM DIRK HEINRICH, HUIJBREGTSE JEROEN, VERBERK ROGIER, VAN KAMPEN MAARTEN
Year of Publication 09.08.2012

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REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS

by DOCHNAHL, AXEL, EHM, DIRK, HEINRICH, VON BLANCKENHAGEN, GISELA
Year of Publication 08.08.2012

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A REFLECTIVE OPTICAL ELEMENT AND METHOD OF PRODUCING IT

by VAN KAMPEN, MAARTEN, VERBERK, ROGIER, EHM, DIRK, HEINRICH, HUIJBREGTSE, JEROEN
Year of Publication 27.06.2012

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Method for cleaning reflective optical element for illumination- and projection system, involves removing metallic deposits from optically utilized surface of reflective optical element by performing wet-chemical treatment

by VERBERK, ROGIER, STORM, ARNOLDUS JAN, EHM, DIRK HEINRICH
Year of Publication 21.06.2012

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PROJECTION EXPOSURE APPARATUS

by SCHMIDT, STEFAN-WOLFGANG, DIER, OLIVER, EHM, DIRK HEINRICH
Year of Publication 07.06.2012

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Optical device for use in projection exposure system for extreme UV microlithography, has surface layer designed such that radiation bundle is weakened in local sections of optical surface

by ENDRES, MARTIN, EHM, DIRK HEINRICH, KALLER, JULIAN
Year of Publication 10.09.2009

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PROJECTION EXPOSURE APPARATUS

by SCHMIDT, STEFAN-WOLFGANG, DIER, OLIVER, EHM, DIRK HEINRICH
Year of Publication 08.03.2012

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DUV - ABSORBERSCHICHT FÜR EUV - SPIEGEL

by HUBER, PETER, EHM, DIRK HEINRICH, ZACZEK, CHRISTOPH
Year of Publication 17.12.2015

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OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD FOR TREATING SUCH AN OPTICAL ELEMENT

by BEKMAN HERMANUS HENDRICUS PETRUS THEODORUS, EHM DIRK HEINRICH, KUZNETSOV ALEXEY, HUIJBREGTSE JEROEN, STORM ARNOLDUS JAN, AMENT IRENE, GRABER TINA, SMEETS DRIES, TE SLIGTE EDWIN
Year of Publication 30.06.2016

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