Search Results - "EHM DIRK HEINRICH" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPHY APPARATUS

METHOD FOR OPERATING AN EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPHY APPARATUS

by EHM, Dirk Heinrich, BECKER, Moritz
Year of Publication 01.03.2023

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Patent

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGRAPHY APPARATUS

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGRAPHY APPARATUS

by EHM, Dirk Heinrich, BECKER, Moritz
Year of Publication 09.02.2023

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Patent

METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY

METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MODULE AND ARRANGEMENT FOR SEMICONDUCTOR LITHOGRAPHY

by Modeste, Benjahman Julius, Ehm, Dirk Heinrich, Kugler, Jens, Nefzi, Marwene
Year of Publication 09.03.2023

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Patent

Optical assembly with a protective element and optical arrangement therewith

Optical assembly with a protective element and optical arrangement therewith

by Schmidt, Stefan-Wolfgang, Ehm, Dirk Heinrich
Year of Publication 01.06.2021

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Patent

Optical assembly, in an euv lithographic projection exposure apparatus, the apparatus and method thereof

Optical assembly, in an euv lithographic projection exposure apparatus, the apparatus and method thereof

by EHM, DIRK HEINRICH, KALLER, JULIAN
Year of Publication 21.01.2024

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Patent

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

by EHM, Dirk Heinrich, SCHMIDT, Stefan-Wolfgang
Year of Publication 18.09.2019

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Patent

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

by EHM, Dirk Heinrich, AMENT, Irene, SCHMIDT, Stefan-Wolfgang, WINTER, Ralf, EVA, Eric, BECKER, Moritz, SHKLOVER, Vitaliy, URICH, Diana, KIEREY, Holger, WIESNER, Stefan, MEIER, Robert, JALICS, Christof
Year of Publication 21.02.2024

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Patent

Method for operating an EUV lithography apparatus, and EUV lithography apparatus

Method for operating an EUV lithography apparatus, and EUV lithography apparatus

by BECKER, MORITZ, EHM, DIRK HEINRICH
Year of Publication 16.12.2021

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Patent

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

by EHM, Dirk Heinrich, SCHMIDT, Stefan-Wolfgang
Year of Publication 05.09.2018

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Patent

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

by EHM, Dirk Heinrich, SCHMIDT, Stefan-Wolfgang
Year of Publication 30.08.2018

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Patent

Method for removing a contamination layer by an atomic layer etching process

Method for removing a contamination layer by an atomic layer etching process

by Roozeboom, Fred, Becker, Moritz, Te Sligte, Edwin, Creijghton, Yves Lodewijk Maria, Ehm, Dirk Heinrich, Illiberi, Andrea
Year of Publication 14.12.2021

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Patent

EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus

EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus

by EHM DIRK HEINRICH, BUTSCHER VERA
Year of Publication 29.03.2016

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Patent

Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus

Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatus

by von Blanckenhagen Gisela, Ehm Dirk Heinrich
Year of Publication 30.01.2018

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Patent

APPARATUS AND METHOD FOR ATOMIC LAYER PROCESSING

APPARATUS AND METHOD FOR ATOMIC LAYER PROCESSING

by EHM, Dirk Heinrich, EIJNDEN, Edwin van den, CREIJGHTON, Yves Lodewijk Maria, SMELTINK, Jeroen, ROOZEBOOM, Fred, BECKER, Moritz, SCHMIDT, Stefan Wolfgang
Year of Publication 05.01.2022

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Patent

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT THEREWITH

by EHM, Dirk Heinrich, SCHMIDT, Stefan-Wolfgang
Year of Publication 04.05.2017

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Patent

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning

by Wiesner, Stefan, Becker, Moritz, Urich, Diana, Ament, Irene, Ehm, Dirk Heinrich, Schmidt, Stefan Wolfgang
Year of Publication 14.07.2020

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Patent

Optical assembly with a protective element and optical arrangement therewith

Optical assembly with a protective element and optical arrangement therewith

by SCHMIDT, STEFAN-WOLFGANG, EHM, DIRK HEINRICH
Year of Publication 11.11.2021

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Patent

METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR

METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR

by MUELLER Juergen, EHM Dirk Heinrich, SCHICKETANZ Thomas
Year of Publication 13.10.2016

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Patent

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

by EHM, Dirk Heinrich, MUELLENDER, Stephan, BLANCKENHAGEN, Gisela von, HUBER, Peter
Year of Publication 04.07.2018

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Patent

Reflective optical element and optical system for EUV lithography

Reflective optical element and optical system for EUV lithography

by Huber, Peter, Von Blanckenhagen, Gisela, Muellender, Stephan, Ehm, Dirk Heinrich
Year of Publication 12.06.2018

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Patent

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