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Year of Publication 14.10.2010
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Year of Publication 01.11.2008
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Method for removing a contamination layer from an optical surface, method for generating a cleaning gas, and corresponding cleaning and cleaning gas generation arrangements
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Year of Publication 01.06.2009
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Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
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Year of Publication 29.07.2009
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Year of Publication 29.07.2009
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Verfahren zum Betrieb einer EUV-Lithographievorrichtung, reflektives optisches Element für EUV-Lithographievorrichtung und Verfahren zu dessen Reinigung
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Year of Publication 19.01.2012
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Year of Publication 19.01.2012
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Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination
MUELLENDER, STEPHAN, MEIJERINK, MARCUS GERHARDUS HENDRIKUS, WOLSCHRIJN, BASTIAAN THEODOOR, STEIN, THOMAS, VERSLUIS, RICHARD, EHM, DIRK HEINRICH, MOORS, JOHANNES HUBERTUS JOSEPHINA, KRAUS, DIETER
Year of Publication 16.08.2008
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Year of Publication 16.08.2008
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