Optisches Element
Wiesner, Stefan, Becker, Moritz, Schmidt, Stefan-Wolfgang, Ament, Irene, Ehm, Dirk Heinrich
Year of Publication 14.07.2016
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Year of Publication 14.07.2016
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PROTECTION MODULE FOR EUV LITHOGRAPHY APPARATUS, AND EUV LITHOGRAPHY APPARATUS
BANNEY, BEN, LAUFER, TIMO, NIEKEN, ULRICH, EHM, DIRK, HEINRICH, KUGLER, JENS, KELLER, FRANZ
Year of Publication 11.03.2010
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Year of Publication 11.03.2010
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Extreme UV-projection illumination system for microlithographic imaging, has spectral filter detachably arranged in spectral aperture and/or aperture diaphragm and transparent for extreme UV-radiation
DENGEL, GUENTHER, BANINE, VADIM YEVGENYEVICH, YAKUNIN, ANDREI M, EHM, DIRK HEINRICH, MOORS, JOHANNES HUBERTUS JOSEPHINA
Year of Publication 04.03.2010
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Year of Publication 04.03.2010
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Cleaning method, apparatus and cleaning system
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MOORS JOHANNES HUBERTUS JOSEPHINA, STEIN THOMAS, MEIJERINK MARCUS GERHARDUS HENDRIKUS
Year of Publication 02.03.2010
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Year of Publication 02.03.2010
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Reflective optical element and optical system for EUV lithography
EHM DIRK HEINRICH, HUBER PETER, MUELLENDER STEPHAN, BLANCKENHAGEN GISELA VON
Year of Publication 29.01.2014
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Year of Publication 29.01.2014
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CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
EHM DIRK HEINRICH, KRAUS DIETER, WIESNER STEFAN, KOEHLER STEFAN, KALLER JULIAN, SCHMIDT STEFAN, CZAP ALMUT, CHUNG HIN-YIU ANTHONY
Year of Publication 10.03.2011
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Year of Publication 10.03.2011
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REFLECTIVE OPTICAL ELEMENT
BECKER, MORITZ, VON BLANCKENHAGEN, GISELA, EHM, DIRK HEINRICH, AMENT, IRENE, WEBER, JÖRN
Year of Publication 18.02.2016
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Year of Publication 18.02.2016
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Reflektives optisches Element
BECKER, MORITZ, VON BLANCKENHAGEN, GISELA, EHM, DIRK HEINRICH, AMENT, IRENE, WEBER, JÖRN
Year of Publication 18.02.2016
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Year of Publication 18.02.2016
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REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
EHM, Dirk Heinrich, AMENT, Irene, SCHMIDT, Stefan-Wolfgang, WINTER, Ralf, EVA, Eric, BECKER, Moritz, SHKLOVER, Vitaliy, URICH, Diana, KIEREY, Holger, WIESNER, Stefan, MEIER, Robert, JALICS, Christof
Year of Publication 01.02.2018
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Year of Publication 01.02.2018
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CLEANING METHOD, APPARATUS AND CLEANING SYSTEM
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MOORS JOHANNES HUBERTUS JOSEPHINA, STEIN THOMAS, MEIJERINK MARCUS GERHARDUS HENDRIKUS
Year of Publication 07.08.2009
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Year of Publication 07.08.2009
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Particle cleaning of optical elements for microlithography
SCACCABAROZZI LUIGI, NAGEL MONA, EHM DIRK HEINRICH, VAN DER DONCK JACQUES COR JOHAN, STORM ARNOLDUS JAN, MOORS JOHANNES HUBERTUS JOSEPHINA, STORTELDER JETSKE KARINA, CABALLERO MARIA ISABEL CATALINA, CZAP ALMUT, SANDTKE MARIJN
Year of Publication 02.07.2013
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Year of Publication 02.07.2013
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Method for removing a contamination layer from an optical surface and arrangement therefor as well as a method for generating a cleaning gas and arrangement therefor
WOLSCHRIJN BASTIAAN THEODOOR, EHM DIRK HEINRICH, MOORS JOHANNES HUBERTUS JOSEPHINA, STORM ARNOLD, STEIN THOMAS, SLIGTE EDWIN TE
Year of Publication 18.11.2010
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Year of Publication 18.11.2010
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