Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography
Dabbagh, Gary, Hutton, Richard S., Cirelli, Raymond A., Novembre, Anthony E., Reichmanis, Elsa, Nalamasu, Omkaram
Published in Journal of Photopolymer Science and Technology (1998)
Published in Journal of Photopolymer Science and Technology (1998)
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Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography
Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M, Novembre, Anthony E
Published in Polymer international (01.10.1999)
Published in Polymer international (01.10.1999)
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Conference Proceeding
RESIST DESIGN CONSIDERATIONS FOR DIRECT WRITE AND PROJECTION ELECTRON-BEAM LITHOGRAPHY TECHNOLOGIES
Novembre, Anthony E., Tarascon, Regine G., Berger, Steven D., Biddick, Chris J., Blakey, Myrtle I., Bolan, Kevin J., Fetter, Linus A., Harriott, Lloyd R., Huggins, Harold A., Knurek, Chester S., Liddle, J. Alexander, Mixon, David A., Peabody, Milton L.
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
SCALPEL mask defect imaging analysis
Stanton, Stuart T., Alexander Liddle, J., Novembre, Anthony E., Mkrtchyan, Masis M.
Published in Microelectronic engineering (1999)
Published in Microelectronic engineering (1999)
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Journal Article
Conference Proceeding
193 nm lithography using a negative acting P(SI-CMS) resist
Smith, Bruce W., Novembre, Anthony E., Mixon, David A.
Published in Microelectronic engineering (01.09.1997)
Published in Microelectronic engineering (01.09.1997)
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t-BOC BASED RESISTS
Nalamasu, Omakaram, E. Novembre, Anthony, M. Kometani, Janet, E. Hanson, James
Published in Journal of photopolymer science and technology (01.10.1993)
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Published in Journal of photopolymer science and technology (01.10.1993)
Journal Article
The SCattering with Angular Limitation in Projection Electron-beam Lithography (SCALPEL) system
LIDDLE, J. A, BERGER, S. D, CUSTY, J, FARROW, R. C, FELKER, J. A, FETTER, L. A, FREEMAN, B, HARRIOTT, L. R, HOPKINS, L.L, HUGGINS, H. A, KNUREK, C. S, KRAUS, J. S, BIDDICK, C. J, MIXON, D. A, MKRTCHYAN, M. M, NOVEMBRE, A. E, PEABODY, M. L, SIMPSON, W. M, TARASCON, R. G, WADE, H. H, WASKIEWICZ, W. K, WATSON, G. P, WILLIAMS, J. K, BLAKEY, M. I, WINDT, D. L, BOLAN, BOWLER, S. W, BRADY, K, CAMARDA, R. M, CONNELLY, W. F, CHORKEN, A
Published in Japanese Journal of Applied Physics (01.12.1995)
Published in Japanese Journal of Applied Physics (01.12.1995)
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