Chemical mechanical polishing of polyarylether low dielectric constant layers by manganese oxide slurry
HARA, T, TOMISAWA, T, KUROSU, T, DOY, T. K
Published in Journal of the Electrochemical Society (01.06.1999)
Published in Journal of the Electrochemical Society (01.06.1999)
Get full text
Journal Article
Mechanism of Mechanical and Chemical Polishing in Low Dielectric Constant Plasma-Enhanced Chemical Vapor Deposition SiOC Layer from Hexamethyldisiloxane
Hara, Tohru, Togoh, Fumiaki, Kurosu, Toshiaki, Sakamoto, Keiichi, Shioya, Yoshimi, Ishimaru, Tomomi, Doy, Toshiro K.
Published in Electrochemical and solid-state letters (01.08.2001)
Published in Electrochemical and solid-state letters (01.08.2001)
Get full text
Journal Article
Polishing to reveal micro-defects on glass
Kasai, Toshio, Horio, Kenichiro, Yamazaki, Tsugio, Komoda, Miyoko, Doy, Toshiro K., Kubo, Naoto
Published in Journal of non-crystalline solids (01.11.1994)
Published in Journal of non-crystalline solids (01.11.1994)
Get full text
Journal Article
Conference Proceeding