Characterization of ultra-shallow p+-n junctions formed by plasma doping with BF3 and N2 plasmas
FELCH, S. B, LEE, B. S, DARYANANI, S. L, DOWNEY, D. F, MATYI, R. J
Published in Materials chemistry and physics (01.07.1998)
Published in Materials chemistry and physics (01.07.1998)
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Journal Article
The role of extended defects on the formation of ultra-shallow junctions in ion implanted /sup 11/B/sup +/, /sup 49/BF/sub 2/, /sup 75/As/sup +/ and /sup 31/P/sup
Downey, D.F., Jones, K.S.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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Advanced doping and millisecond annealing for ultra-shallow junctions for 65 nm and beyond
McCoy, S.P., Arevalo, E.A., Gelpey, J.C., Downey, D.F.
Published in 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004 (2004)
Published in 12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004 (2004)
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Fluorine effect on boron diffusion: chemical or damage?
Liu, J., Downey, D.F., Jones, K.S., Ishida, E.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1998)
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Conference Proceeding
Production worthy repeatability of spike anneals
Paul, S., Bayha, B., Lerch, W., Merkl, C., Downey, D.F., Arevalo, E.A.
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
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Fluorine effects in BF/sub 2//sup +/ implants at various energies
Felch, S.B., Lee, B.S., Downey, D.F., Zhao, Z., Eddy, R.J.
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
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Conference Proceeding
The effect of implant species and doping level on cobalt silicide contact formation on ultra-shallow junctions
Osburn, C.M., Ishida, E., Downey, D.F., Variam, N., Stockwell, W.
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1999)
Published in 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) (1999)
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Conference Proceeding
Effect of microwave radiation on boron activation
Thompson, K., Booske, J.H., Downey, D.F., Arevalo, E.A.
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
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Conference Proceeding
Dependence of junction depth and sheet resistance on the thermal budget in the low temperature pre-stabilization regime
Bayha, B., Paul, S., Lerch, W., Downey, D.F., Arevalo, E.A., Hebras, X., Cherkashin, N.
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
Published in Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on (2002)
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The influence of "off-axis" from [100] oriented Si wafers on junction depth and sheet resistance for low-energy implantation and rapid thermal annealing
Lerch, W., Downey, D.F., Arevalo, E.A., Ostermeir, R.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Sub-melt laser annealing followed by low-temperature RTP for minimized diffusion
Felch, S.B., Downey, D.F., Arevalo, A., Talwar, S., Gelatos, C., Wang, Y.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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The role of fluorine on reducing TED in boron implanted silicon
Robertson, L.S., Warnes, P.N., Law, M.E., Jones, K.S., Downey, D.F., Liu, J.
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
Published in 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) (2000)
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Metals-contamination-reduction program for the Varian EHP-220/500 medium-current ion implanter
Swenson, D.R., Downey, D.F., Walther, S.R., Renau, A., Gammel, G., Mack, M.E.
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
Published in Proceedings of 11th International Conference on Ion Implantation Technology (1996)
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