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Year of Publication 26.07.2012
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Hardmask compositions for resist underlayer films
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Year of Publication 01.02.2011
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Anisotropic conductive film and semiconductor device
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Year of Publication 21.08.2015
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Year of Publication 21.08.2015
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HARDMASK COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, PROCESS FOR PRODUCING A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
YUN HUI CHAN, KIM DO HYEON, KOH SANG RAN, LIM SANG HAK, KIM JONG SEOB, KIM MI YOUNG, KIM SANG KYUN, UH DONG SEON
Year of Publication 06.10.2011
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Year of Publication 06.10.2011
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