Preparation and characterization of composite coatings containing a quaternary ammonium salt as an anti-static agent
Kugimoto, Yuki, Wakabayashi, Atsumi, Dobashi, Toshiaki, Ohnishi, Osamu, Doi, Toshiro K., Kurokawa, Syuhei
Published in Progress in organic coatings (01.03.2016)
Published in Progress in organic coatings (01.03.2016)
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Journal Article
Tungsten Film Chemical Mechanical Polishing Using MnO2 Slurry
Kishii, Sadahiro, Hatada, Akiyoshi, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.07.2011)
Published in Jpn J Appl Phys (01.07.2011)
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Journal Article
Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage
Sano, Yasuhisa, Doi, Toshiro K, Kurokawa, Syuhei, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Shiozawa, Kousuke, Okada, Yu, Yamauchi, Kazuto
Published in Sensors and materials (2014)
Published in Sensors and materials (2014)
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Journal Article
Mn2O3 Slurry Reuse by Circulation Achieving High Constant Removal Rate
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.04.2012)
Published in Jpn J Appl Phys (01.04.2012)
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Journal Article
Mn2O3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K
Published in Jpn J Appl Phys (01.04.2012)
Published in Jpn J Appl Phys (01.04.2012)
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Journal Article
Building of super high-efficiency processing technology based on innovative concept (Establishment of effective polishing process of SiC substrate using Dilatancy pad tool with bowl feed method)
DOI, Toshiro K., SESHIMO, Kiyoshi, YAMAZAKI, Tsutomu, OHTSUBO, Masanori, NISHIZAWA, Hideaki, MURAKAMI, Sachi, ICHIKAWA, Daizo, NAKAMURA, Yoshio, MIYASHITA, Tadakazu, KAWAMURA, Yoshihide, TAKAGI, Masataka, KASHIWADA, Hiroshi, AIDA, Hideo
Published in Kikai Gakkai ronbunshū = Transactions of the Japan Society of Mechanical Engineers (2015)
Published in Kikai Gakkai ronbunshū = Transactions of the Japan Society of Mechanical Engineers (2015)
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Journal Article
Challenges of future high-precision polishing methods for hard-to-process materials by the fusion of environmental control and plasma technology
K. Toshiro DOI, Hideo AIDA, Osamu OHNISHI, Shaohui YIN, Yinghui REN
Published in Jin gang shi yu mo liao mo ju gong cheng (01.12.2022)
Published in Jin gang shi yu mo liao mo ju gong cheng (01.12.2022)
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Journal Article
Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining (CMP/P-CVM) Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts
Doi, Toshiro K, Sano, Yasuhisa, Kurowaka, Syuhei, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Ohyama, Koki
Published in Sensors and materials (2014)
Published in Sensors and materials (2014)
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Journal Article
Precision Profile Measurement System for Microholes Using Vibrating Optical Fiber
Sajima, Takao, Murakami, Hiroshi, Katsuki, Akio, Tabuchi, Daisuke, Ohnishi, Osamu, Kurokawa, Syuhei, Onikura, Hiromichi, Doi, Toshiro K
Published in Sensors and materials (01.01.2012)
Published in Sensors and materials (01.01.2012)
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Journal Article
Scanning Measurement and Evaluation of Gear Tooth Root and Bottom Profiles
Kido, Hiromitsu, Ohnishi, Osamu, Doi, Toshiro K., Taguchi, Tetsuya, Okada, Tatsuki, Kurokawa, Syuhei
Published in Applied Mechanics and Materials (01.08.2011)
Published in Applied Mechanics and Materials (01.08.2011)
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Journal Article
Smart Polishing of Hard-to-Machine Materials with an Innovative Dilatancy Pad under High-Pressure, High-Speed, Immersed Condition
Doi, Toshiro K., Seshimo, Kiyoshi, Yamazaki, Tsutomu, Ohtsubo, Masanori, Ichikawa, Daizo, Miyashita, Tadakazu, Takagi, Masataka, Saeki, Taku, Aida, Hideo
Published in ECS journal of solid state science and technology (01.01.2016)
Published in ECS journal of solid state science and technology (01.01.2016)
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Journal Article
Mn 2 O 3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.04.2012)
Published in Japanese Journal of Applied Physics (01.04.2012)
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Journal Article
Mn 2 O 3 Slurry Achieving Reduction of Slurry Waste
Kishii, Sadahiro, Nakamura, Ko, Hanawa, Kenzo, Watanabe, Satoru, Arimoto, Yoshihiro, Kurokawa, Syuhei, Doi, Toshiro K.
Published in Japanese Journal of Applied Physics (01.04.2012)
Published in Japanese Journal of Applied Physics (01.04.2012)
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Journal Article