Electrical and materials properties of AlN/ HfO2 high-k stack with a metal gate
Reid, Kimberly G., Dip, Anthony, Sasaki, Sadao, Triyoso, Dina, Samavedam, Sri, Gilmer, David, Gondran, Carolyn F.H.
Published in Thin solid films (27.02.2009)
Published in Thin solid films (27.02.2009)
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