Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si $_1-x$ Ge $_x
ElMubarek, H.A.W., Karunaratne, M., Bonar, J.M., Dilliway, G.D., Wang, Y., Hemment, P.L.F., Willoughby, A.F., Ashburn, P.
Published in IEEE transactions on electron devices (01.04.2005)
Published in IEEE transactions on electron devices (01.04.2005)
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Journal Article
Effect of fluorine implantation dose on boron thermal diffusion in silicon
El Mubarek, H. A. W., Bonar, J. M, Dilliway, G. D., Ashburn, P., Karunaratne, M., Willoughby, A. F., Wang, Y., Hemment, P. L. F., Price, R., Zhang, J., Ward, P.
Published in Journal of applied physics (15.10.2004)
Published in Journal of applied physics (15.10.2004)
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Journal Article
Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si1-xGex
EL MUBAREK, H. A. W, KARUNARATNE, M, BONAR, J. M, DILLIWAY, G. D, WANG, Y, HEMMENT, P. L. F, WILLOUGHBY, A. F, ASHBURN, P
Published in IEEE transactions on electron devices (01.04.2005)
Published in IEEE transactions on electron devices (01.04.2005)
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Journal Article
Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x
Mubarek, H.A.W.E., Karunaratne, M., Bonar, J.M., Dilliway, G.D., Wang, Y., Hemment, P.L.F., Willoughby, A.F., Ashburn, P.
Published in IEEE transactions on electron devices (01.04.2005)
Published in IEEE transactions on electron devices (01.04.2005)
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Journal Article
Catalyst free low temperature direct growth of carbon nanotubes
Uchino, T., Bourdakos, K.N., de Groot, C.H., Ashburn, P., Wang, S., Kiziroglou, M.E., Dilliway, G.D., Smith, D.C.
Published in 5th IEEE Conference on Nanotechnology, 2005 (2005)
Published in 5th IEEE Conference on Nanotechnology, 2005 (2005)
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