Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization
Pons, M, Baillet, F, Blanquet, E, Pernot, E, Madar, R, Chaussende, D, Mermoux, M, Di Coccio, L, Ferret, P, Feuillet, G, Faure, C, Billon, Th
Published in Applied surface science (15.05.2003)
Published in Applied surface science (15.05.2003)
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Journal Article
Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization
PONS, M, BAILLET, F, FAURE, C, BILLON, Th, BLANQUET, E, PERNOT, E, MADAR, R, CHAUSSENDE, D, MERMOUX, M, DI COCCIO, L, FERRET, P, FEUILLET, G
Published in Applied surface science (2003)
Get full text
Published in Applied surface science (2003)
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