65 nm Device Manufacture Using Shaped E-Beam Lithography
Pain, Laurent, Jurdit, Murielle, Laplanche, Yves, Todeschini, Jérôme, Leininger, Hugues, Tourniol, Sonia, Faure, Romuald, Bossy, Xavier, Palla, Ramiro, Beverina, Alessio, Broekaart, Marcel, Judong, Fabienne, Brosselin, Karine, Depoyan, Linda, Friec, Yannick Le, Leverd, Francois, Jonghe, Veronique De, Josse, Emmanuelle, Hinsinger, Olivier, Brun, Philippe, Henry, Daniel, Woo, Michael, Stolk, Peter, Tavel, Brice, Arnaud, Franck
Published in Japanese Journal of Applied Physics (01.06.2004)
Published in Japanese Journal of Applied Physics (01.06.2004)
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Journal Article
0.13 \mu m SiGe BiCMOS Technology Fully Dedicated to mm-Wave Applications
Avenier, G., Diop, M., Chevalier, P., Troillard, G., Loubet, N., Bouvier, J., Depoyan, L., Derrier, N., Buczko, M., Leyris, C., Boret, S., Montusclat, S., Margain, A., Pruvost, S., Nicolson, S.T., Yau, K.H.K., Revil, N., Gloria, D., Dutartre, D., Voinigescu, S.P., Chantre, A.
Published in IEEE journal of solid-state circuits (01.09.2009)
Published in IEEE journal of solid-state circuits (01.09.2009)
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Si and SiGe faceting during selective epitaxy
Pribat, Clément, Servanton, Germain, Depoyan, Linda, Dutartre, Didier
Published in Solid-state electronics (01.08.2009)
Published in Solid-state electronics (01.08.2009)
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Journal Article
Conference Proceeding
Influence of the Selectively Implanted Collector Integration on +400 GHz f MAX Si/SiGe:C HBTs
Lacave, Thomas, Chevalier, Pascal, Campidelli, Yves, Depoyan, Linda, Berthier, Ludovic, André, Frederic, Buczko, Michel, Avenier, Gregory, Gaquière, Christophe, Chantre, Alain
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
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Journal Article
0.13 μm SiGe BiCMOS Technology Fully Dedicated to mm-Wave Applications : THE 2008 BIPOLAR/BICMOS CIRCUITS AND TECHNOLOGY MEETING
AVENIER, Grégory, DIOP, Malick, BORET, Samuel, MONTUSCLAT, Sébastien, MARGAIN, Alain, PRUVOST, Sébastien, NICOLSON, Sean T, YAU, Kenneth H. K, REVIL, Nathalie, GLORIA, Daniel, DUTARTRE, Didier, VOINIGESCU, Sorin P, CHEVALIER, Pascal, CHANTRE, Alain, TROILLARD, Germaine, LOUBET, Nicolas, BOUVIER, Julien, DEPOYAN, Linda, DERRIER, Nicolas, BUCZKO, Michel, LEYRIS, Cédric
Published in IEEE journal of solid-state circuits (2009)
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Published in IEEE journal of solid-state circuits (2009)
Journal Article
Study of a 4 Micron Oxide Etching Using C5F8/O2/Ar Plasma
Judong, Fabienne, Depoyan, Linda, Hotellier, Nicolas, Baudrier, Martial, Bouillon, Pierre
Published in ECS transactions (28.04.2006)
Published in ECS transactions (28.04.2006)
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Journal Article
Pushing conventional SiGe HBT technology towards "Dotfive" terahertz
Chantre, Alain, Chevalier, Pascal, Lacave, Thomas, Avenier, Gregory, Buczko, Michel, Campidelli, Yves, Depoyan, Linda, Berthier, Ludovic, Gacquière, Christophe
Published in The 5th European Microwave Integrated Circuits Conference (01.09.2010)
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Published in The 5th European Microwave Integrated Circuits Conference (01.09.2010)
Conference Proceeding
Influence of the Selectively Implanted Collector Integration on +400 GHz f MAX Si/SiGe:C HBTs
Lacave, Thomas, Chevalier, Pascal, Campidelli, Yves, Depoyan, Linda, Berthier, Ludovic, André, Frederic, Buczko, Michel, Avenier, Gregory, Gaquière, Christophe, Chantre, Alain
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
Published in Meeting abstracts (Electrochemical Society) (08.07.2010)
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Journal Article
Study of a 4 Microns Oxide Etching using C5F8/O2/Ar plasma
Judong, Fabienne, Depoyan, Linda, Hotellier, Nicolas, Baudrier, Martial, Bouillon, Pierre
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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Journal Article