Multiscale plasma and feature profile simulations of plasma-enhanced chemical vapor deposition and atomic layer deposition processes for titanium thin film fabrication
Denpoh, Kazuki, Moroz, Paul, Kato, Taiki, Matsukuma, Masaaki
Published in Japanese Journal of Applied Physics (01.05.2020)
Published in Japanese Journal of Applied Physics (01.05.2020)
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Journal Article
Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
Iwashita, Shinya, Denpoh, Kazuki, Kagaya, Munehito, Kikuchi, Takamichi, Noro, Naotaka, Hasegawa, Toshio, Moriya, Tsuyoshi, Uedono, Akira
Published in Thin solid films (30.08.2018)
Published in Thin solid films (30.08.2018)
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Journal Article
Impact of ion energies in Ar/H2 capacitively coupled radio frequency discharges on PEALD processes of titanium films
Iwashita, Shinya, Denpoh, Kazuki, Kikuchi, Takamichi, Suzuki, Yusuke, Wagatsuma, Yuichiro, Hasegawa, Toshio, Moriya, Tsuyoshi
Published in Surface & coatings technology (25.09.2018)
Published in Surface & coatings technology (25.09.2018)
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Journal Article
Sheath Model for Dual-Frequency Capacitively Coupled Plasmas
Denpoh, Kazuki, Wakayama, Go, Nanbu, Kenichi
Published in Japanese Journal of Applied Physics (01.08.2004)
Published in Japanese Journal of Applied Physics (01.08.2004)
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Journal Article
Impact of ion energies in Ar/H^sub 2^ capacitively coupled radio frequency discharges on PEALD processes of titanium films
Iwashita, Shinya, Denpoh, Kazuki, Kikuchi, Takamichi, Suzuki, Yusuke, Wagatsuma, Yuichiro, Hasegawa, Toshio, Moriya, Tsuyoshi
Published in Surface & coatings technology (25.09.2018)
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Published in Surface & coatings technology (25.09.2018)
Journal Article
Computational study on silicon oxide plasma enhanced chemical vapor deposition (PECVD) process using tetraethoxysilane/oxygen/argon/ helium
Li, Hu, Higuchi, Hisashi, Kawaguchi, Satoru, Satoh, Kohki, Denpoh, Kazuki
Published in Japanese Journal of Applied Physics (01.06.2019)
Published in Japanese Journal of Applied Physics (01.06.2019)
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Journal Article