Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2S
Groven, Benjamin, Heyne, Markus, Nalin Mehta, Ankit, Bender, Hugo, Nuytten, Thomas, Meersschaut, Johan, Conard, Thierry, Verdonck, Patrick, Van Elshocht, Sven, Vandervorst, Wilfried, De Gendt, Stefan, Heyns, Marc, Radu, Iuliana, Caymax, Matty, Delabie, Annelies
Published in Chemistry of materials (11.04.2017)
Published in Chemistry of materials (11.04.2017)
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Journal Article
Two-Dimensional Crystal Grain Size Tuning in WS2 Atomic Layer Deposition: An Insight in the Nucleation Mechanism
Groven, Benjamin, Nalin Mehta, Ankit, Bender, Hugo, Meersschaut, Johan, Nuytten, Thomas, Verdonck, Patrick, Conard, Thierry, Smets, Quentin, Schram, Tom, Schoenaers, Ben, Stesmans, Andre, Afanasʼev, Valeri, Vandervorst, Wilfried, Heyns, Marc, Caymax, Matty, Radu, Iuliana, Delabie, Annelies
Published in Chemistry of materials (13.11.2018)
Published in Chemistry of materials (13.11.2018)
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CMOS Process-Compatible High-Power Low-Leakage AlGaN/GaN MISHEMT on Silicon
Van Hove, M., Boulay, S., Bahl, S. R., Stoffels, S., Xuanwu Kang, Wellekens, D., Geens, K., Delabie, A., Decoutere, S.
Published in IEEE electron device letters (01.05.2012)
Published in IEEE electron device letters (01.05.2012)
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Journal Article
Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry
Claessens, Niels, Khan, Zamran Zahoor, Haghighi, Negin Rahnemai, Delabie, Annelies, Vantomme, André, Vandervorst, Wilfried, Meersschaut, Johan
Published in Scientific reports (22.10.2022)
Published in Scientific reports (22.10.2022)
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Formation mechanism of 2D SnS2 and SnS by chemical vapor deposition using SnCl4 and H2S
Zhang, Haodong, Yashwanth Balaji, Ankit Nalin Mehta, Heyns, Marc, Caymax, Matty, Radu, Iuliana, Vandervorst, Wilfried, Delabie, Annelies
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (2018)
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (2018)
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Journal Article
Diffusion‐Mediated Growth and Size‐Dependent Nanoparticle Reactivity during Ruthenium Atomic Layer Deposition on Dielectric Substrates
Soethoudt, Job, Grillo, Fabio, Marques, Esteban A., Ommen, J. Ruud, Tomczak, Yoann, Nyns, Laura, Elshocht, Sven, Delabie, Annelies
Published in Advanced materials interfaces (01.12.2018)
Published in Advanced materials interfaces (01.12.2018)
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Journal Article
Quantified Uniformity and Selectivity of TiO2 Films in 45‐nm Half Pitch Patterns Using Area‐Selective Deposition Supercycles
Nye, Rachel A., Van Dongen, Kaat, Marneffe, Jean‐François, Parsons, Gregory N., Delabie, Annelies
Published in Advanced materials interfaces (01.07.2023)
Published in Advanced materials interfaces (01.07.2023)
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Journal Article
Surface Chemistry and Interface Formation during the Atomic Layer Deposition of Alumina from Trimethylaluminum and Water on Indium Phosphide
Adelmann, Christoph, Cuypers, Daniel, Tallarida, Massimo, Rodriguez, Leonard N. J, De Clercq, Astrid, Friedrich, Daniel, Conard, Thierry, Delabie, Annelies, Seo, Jin Won, Locquet, Jean-Pierre, De Gendt, Stefan, Schmeisser, Dieter, Van Elshocht, Sven, Caymax, Matty
Published in Chemistry of materials (09.04.2013)
Published in Chemistry of materials (09.04.2013)
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Journal Article
The conversion mechanism of amorphous silicon to stoichiometric WS2
Heyne, Markus H, de Marneffe, Jean-François, Nuytten, Thomas, Meersschaut, Johan, Conard, Thierry, Caymax, Matty, Radu, Iuliana, Delabie, Annelies, Neyts, Erik C, De Gendt, Stefan
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (2018)
Published in Journal of materials chemistry. C, Materials for optical and electronic devices (2018)
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Journal Article
Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask
Wu, Meiyi, de Marneffe, Jean-François, Opsomer, Karl, Detavernier, Christophe, Delabie, Annelies, Naujok, Philipp, Caner, Özge, Goodyear, Andy, Cooke, Mike, Saadeh, Qais, Soltwisch, Victor, Scholze, Frank, Philipsen, Vicky
Published in Micro and Nano Engineering (01.08.2021)
Published in Micro and Nano Engineering (01.08.2021)
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Journal Article
Ruthenocene and cyclopentadienyl pyrrolyl ruthenium as precursors for ruthenium atomic layer deposition: a comparative study of dissociation enthalpies
Phung, Quan Manh, Vancoillie, Steven, Delabie, Annelies, Pourtois, Geoffrey, Pierloot, Kristine
Published in Theoretical chemistry accounts (01.07.2012)
Published in Theoretical chemistry accounts (01.07.2012)
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Journal Article
Atomic layer deposition of hafnium oxide on germanium substrates
Delabie, Annelies, Puurunen, Riikka L., Brijs, Bert, Caymax, Matty, Conard, Thierry, Onsia, Bart, Richard, Olivier, Vandervorst, Wilfried, Zhao, Chao, Heyns, Marc M., Meuris, Marc, Viitanen, Minna M., Brongersma, Hidde H., de Ridder, Marco, Goncharova, Lyudmila V., Garfunkel, Eric, Gustafsson, Torgny, Tsai, Wilman
Published in Journal of applied physics (15.03.2005)
Published in Journal of applied physics (15.03.2005)
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Atomic imaging of nucleation of trimethylaluminum on clean and H2O functionalized Ge(100) surfaces
Lee, Joon Sung, Kaufman-Osborn, Tobin, Melitz, Wilhelm, Lee, Sangyeob, Delabie, Annelies, Sioncke, Sonja, Caymax, Matty, Pourtois, Geoffrey, Kummel, Andrew C
Published in The Journal of chemical physics (07.08.2011)
Published in The Journal of chemical physics (07.08.2011)
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(Invited) Status and Trends in Ge CMOS Technology
Claeys, Cor, Mitard, Jerome, Hellings, Geert, Eneman, Geert, De Jaeger, Brice, Witters, Liebeth, Loo, Roger, Delabie, Annelies, Sioncke, Sonja, Caymax, Matty, Simoen, Eddy
Published in ECS transactions (28.06.2013)
Published in ECS transactions (28.06.2013)
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Characterization of Porous Structures in Advanced Low-$k$ Films with Thin TaN Layers Using Monoenergetic Positron Beams
Uedono, Akira, Verdonck, Patrick, Delabie, Annelies, Swerts, Johan, Witters, Thomas, Conard, Thierry, Baklanov, Mikhail R, Elshocht, Sven Van, Oshima, Nagayasu, Suzuki, Ryoichi
Published in Japanese Journal of Applied Physics (01.10.2013)
Published in Japanese Journal of Applied Physics (01.10.2013)
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Journal Article
High-Performance Ge MOS Capacitors by \hbox Plasma Passivation and \hbox Ambient Annealing
Qi Xie, Shaoren Deng, Schaekers, M., Lin, D., Caymax, M., Delabie, A., Yulong Jiang, Xinping Qu, Deduytsche, D., Detavernier, C.
Published in IEEE electron device letters (01.12.2011)
Published in IEEE electron device letters (01.12.2011)
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The Importance of Moisture Control for EOT Scaling of Hf-Based Dielectrics
Ragnarsson, Lars-Åke, Brunco, David P., Yamamoto, Kazuhiko, Tökei, Zsolt, Pourtois, Geoffrey, Delabie, Annelies, Parmentier, Brigitte, Conard, Thierry, Roussel, Philippe, De Gendt, Stefan, Heyns, Marc M.
Published in Journal of the Electrochemical Society (2009)
Published in Journal of the Electrochemical Society (2009)
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