Template fabrication schemes for step and flash imprint lithography
Bailey, T.C., Resnick, D.J., Mancini, D., Nordquist, K.J., Dauksher, W.J., Ainley, E., Talin, A., Gehoski, K., Baker, J.H., Choi, B.J., Johnson, S., Colburn, M., Meissl, M., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Journal Article
Conference Proceeding
Nano-imprint lithography: Templates, imprinting and wafer pattern transfer
Dauksher, W.J., Le, N.V., Ainley, E.S., Nordquist, K.J., Gehoski, K.A., Young, S.R., Baker, J.H., Convey, D., Mangat, P.S.
Published in Microelectronic engineering (01.04.2006)
Published in Microelectronic engineering (01.04.2006)
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Journal Article
Conference Proceeding
Fabrication of multi-tiered structures on step and flash imprint lithography templates
Johnson, S., Resnick, D.J., Mancini, D., Nordquist, K., Dauksher, W.J., Gehoski, K., Baker, J.H., Dues, L., Hooper, A., Bailey, T.C., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.06.2003)
Published in Microelectronic engineering (01.06.2003)
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Journal Article
Conference Proceeding
Improved step and flash imprint lithography templates for nanofabrication
Resnick, D.J., Mancini, D., Dauksher, W.J., Nordquist, K., Bailey, T.C., Johnson, S., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Published in Microelectronic engineering (01.09.2003)
Published in Microelectronic engineering (01.09.2003)
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Journal Article
Modeling and experimental data using a new high rate ICP tool for dry etching 200 mm EPL masks
Dauksher, W.J., Clemens, S.B., Resnick, D.J., Smith, K.H., Mangat, P.J.S., Rauf, S., Stout, P., Ventzek, P.L.G., Ashraf, H., Lea, L., Hall, S., Hopkins, J., Chambers, A.
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Journal Article
Conference Proceeding
Step and Flash Imprint Lithography Modeling and Process Development
Johnson, S., Burns, R., Kim, E. K., Schmid, G., Dicky, M., Meiring, J., Burns, S., Stacey, N., Wilson, C. G., Convey, D., Wei, Y., Fejes, P., Gehoski, K., Mancini, D., Nordquist, K., Dauksher, W. J., Resnick, D. J.
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks
Dauksher, W.J., Clemens, S.B., Resnick, D.J., Smith, K.H., Mangat, P.J.S., Rauf, S., Ventzek, P.L.G., Arunachalam, V., Ramamurthi, B.N., Ashraf, H., Lea, L., Hall, S., Johnston, I.R., Hopkins, J., Bhardwaj, J.K.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Conference Proceeding
Large area electron scattering effects on SCALPEL mask critical dimension control
Nordquist, K., Resnick, D.J., Ivin, V., Mangat, P., Lu, B., Masnyj, Z., Ainley, E., Dauksher, W.J., Mancini, D., Silakov, M., Minyushkin, D., Vorotnikova, N.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Thermal characteristics of an X-ray mask during pattern transfer
Resnick, D.J., Pendharkar, S.V., Dauksher, W.J., Cummings, K.D., Laudon, M.F., Romanowicz, B., Renaud, P., Engelstad, R.L.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Journal Article
Conference Proceeding
Etch characteristics of an amorphous refractory absorber
Resnick, D.J., Pendharkar, S.V., Dauksher, W.J., Cummings, K.D., Johnson, W.A., Constantine, C.
Published in Microelectronic engineering (01.01.1996)
Published in Microelectronic engineering (01.01.1996)
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Journal Article
Conference Proceeding
A new operating regime for electroplating the gold absorber on x-ray masks
Dauksher, W.J., Resnick, D.J., Johnson, W.A., Yanof, A.W.
Published in Microelectronic engineering (1994)
Published in Microelectronic engineering (1994)
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Journal Article
Critical dimension issues for 200 mm electron projection masks
Resnick, D.J., Nordquist, K., Dauksher, W.J., Ainley, E., Lu, B., Mangat, P., Weisbrod, E., Martin, C., Wei, A., Englestad, R., Lovell, E., Ivin, V.
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
Published in Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387) (2000)
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Conference Proceeding
Distortion and overlay performance of UV step and repeat imprint lithography
Choi, Jin, Nordquist, Kevin, Cherala, Ashuman, Casoose, Lester, Gehoski, Kathy, Dauksher, William J., Sreenivasan, S.V., Resnick, Douglas J.
Published in Microelectronic engineering (01.03.2005)
Published in Microelectronic engineering (01.03.2005)
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Journal Article
Conference Proceeding
Selective dry etch process for step and flash imprint lithography
Le, Ngoc V., Dauksher, William J., Gehoski, Kathy A., Resnick, Douglas J., Hooper, A.E., Johnson, Steve, Willson, Grant
Published in Microelectronic engineering (01.03.2005)
Published in Microelectronic engineering (01.03.2005)
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Journal Article
Conference Proceeding
Fabrication of step and flash imprint lithography templates using a variable shaped-beam exposure tool
Dauksher, William J., Mancini, David, Nordquist, Kevin, Resnick, Douglas J., Hudek, Peter, Beyer, Dirk, Groves, Tim, Fortagne, Olaf
Published in Microelectronic engineering (01.11.2004)
Published in Microelectronic engineering (01.11.2004)
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Journal Article
A new operating regime for electroplating the gold absorber on x-ray masks
Dauksher, W J, Resnick, D J, Johnson, W A, Yanof, A W
Published in Microelectronic engineering (26.09.1993)
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Published in Microelectronic engineering (26.09.1993)
Journal Article
Improved step and flash imprint lithography templates for nanofabrication
RESNICK, D. J, MANCINI, D, DAUKSHER, W. J, NORDQUIST, K, BAILEY, T. C, JOHNSON, S, SREENIVASAN, S. V, EKERDT, J. G, WILLSON, C. G
Published in Microelectronic engineering (2003)
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Published in Microelectronic engineering (2003)
Conference Proceeding
Large area electron scattering effects on SCALPEL mask critical dimension control
NORDQUIST, K, RESNICK, D. J, MINYUSHKIN, D, VOROTNIKOVA, N, IVIN, V, MANGAT, P, LU, B, MASNYJ, Z, AINLEY, E, DAUKSHER, W. J, MANCINI, D, SILAKOV, M
Published in Microelectronic engineering (2001)
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Published in Microelectronic engineering (2001)
Conference Proceeding
Critical Dimension Issues for 200 mm Electron Projection Masks
Resnick, Douglas J., Nordquist, Kevin, Dauksher, William J., Ainley, Eric, Lu, Bing, Mangat, Pawitter, Weisbrod, Eric, Martin, Carl, Chang, J., Englestad, Roxann, Lovell, Ed, Ivin, Vladimir
Published in Japanese Journal of Applied Physics (2000)
Published in Japanese Journal of Applied Physics (2000)
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