An antireflective coating composition and use thereof
DURHAM, DANA+, CORSO, ANTHONY, DAMMEL, RALPH, DING, SHUJI, MCCULLOCH, IAIN
Year of Publication 21.01.2001
Get full text
Year of Publication 21.01.2001
Patent
Photoactive compounds
DAMMEL RALPH R, RENTKIEWICZ DAVID, RAHMAN M. D, PADMANABAN MUNIRATHNA, HOULIHAN FRANCIS M, LEE SANGHO, ANYADIEGWU CLEMENT
Year of Publication 18.01.2007
Get full text
Year of Publication 18.01.2007
Patent
PHOTOACTIVE COMPOUNDS
RAHMAN, M., DALIL, LEE, SANGHO, DAMMEL, RALPH, R, RENTKIEWICZ, DAVID, ANYADIEGWU, CLEMENT, PADMANABAN, MUNIRATHNA, HOULIHAN, FRANCIS, M
Year of Publication 18.01.2007
Get full text
Year of Publication 18.01.2007
Patent
A PROCESS OF IMAGING A PHOTORESIST WITH MULTIPLE ANTIREFLECTIVE COATINGS
ABDALLAH, DAVID, J, PAWLOWSKI, GEORG, ROMANO, ANDREW, R, DAMMEL, RALPH, R, BIAFORE, JOHN, NEISSER, MARK, O, KIM, WOOKYU
Year of Publication 16.11.2006
Get full text
Year of Publication 16.11.2006
Patent
Positive-working photoimageable bottom antireflective coating
DAMMEL RALPH R, DING-LEE SHUJI, OBERLANDER JOSEPH E, NEISSER MARK O, TOUKHY MEDHAT A
Year of Publication 18.01.2005
Get full text
Year of Publication 18.01.2005
Patent
Positive-working photoimageable bottom antireflective coating
Oberlander, Joseph E, Dammel, Ralph R, Ding-Lee, Shuji, Neisser, Mark O, Toukhy, Medhat A
Year of Publication 18.01.2005
Get full text
Year of Publication 18.01.2005
Patent
POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
OBERLANDER, JOSEPH, E, TOUKHY, MEDHAT, A, DAMMEL, RALPH, R, DING-LEE, SHUJI, NEISSER, MARK, O
Year of Publication 29.12.2004
Get full text
Year of Publication 29.12.2004
Patent
Substituted polyhydroxystyrenes as matrix resins for chemically amplified deep UV resist materials
Pawlowski, Georg, Dammel, Ralph, Eckes, Charlotte, Lindley, Charlet R., Meier, Winfried, Przybilla, Klaus-Jürgen, Röschert, Horst, Spiess, Walter
Published in Microelectronic engineering (01.01.1991)
Published in Microelectronic engineering (01.01.1991)
Get full text
Journal Article
Antireflective composition for a deep ultraviolet photoresist
OBERLANDER, JOSEPH E, DAMMEL, RALPH R, FICNER, STANLEY A, PADMANABAN, MUNIRATHNA, SAGAN, JOHN P
Year of Publication 01.11.2004
Get full text
Year of Publication 01.11.2004
Patent
A PROCESS OF IMAGING A PHOTORESIST WITH MULTIPLE ANTIREFLECTIVE COATINGS
ABDALLAH, DAVID, J, PAWLOWSKI, GEORG, ROMANO, ANDREW, R, DAMMEL, RALPH, R, BIAFORE, JOHN, NEISSER, MARK, O, KIM, WOOKYU
Year of Publication 17.08.2006
Get full text
Year of Publication 17.08.2006
Patent
POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING
OBERLANDER, JOSEPH, E, TOUKHY, MEDHAT, A, DAMMEL, RALPH, R, DING-LEE, SHUJI, NEISSER, MARK, O
Year of Publication 13.10.2004
Get full text
Year of Publication 13.10.2004
Patent
NEGATIVE-WORKING PHOTOIMABEABLE BOTTOM ANTIREFLECTIVE COATING
OBERLANDER, JOSEPH, E, TOUKHY, MEDHAT, A, DAMMEL, RALPH, R, DING-LEE, SHUJI, NEISSER, MARK, O
Year of Publication 13.10.2004
Get full text
Year of Publication 13.10.2004
Patent
Process of imaging a photoresist with multiple antireflective coatings
DAMMEL RALPH R, ROMANO ANDREW R, ABDALLAH DAVID J, PAWLOWSKI GEORG, BIAFORE JOHN, NEISSER MARK O, KIM WOOKYU
Year of Publication 10.08.2006
Get full text
Year of Publication 10.08.2006
Patent