Composition for coating over a photoresist pattern comprising a lactam
DAMMEL RALPH R, THIYAGARAJAN MUTHIAH, KANG WENBING, CAO YI, HONG SUNGEUN, ANYADIEGWU CLEMENT
Year of Publication 12.04.2011
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Year of Publication 12.04.2011
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Composition for coating over a photoresist pattern comprising a lactam
Thiyagarajan, Muthiah, Dammel, Ralph R, Cao, Yi, Hong, SungEun, Kang, WenBing, Anyadiegwu, Clement
Year of Publication 12.04.2011
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Year of Publication 12.04.2011
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ANTIRELECTIVE COATING COMPOSITIONS
LIN, GUANYANG, NEISSER, MARK, YAO, HUIRONG, YIN, JIAN, DAMMEL, RALPH, R, WU, HENGPENG
Year of Publication 30.03.2011
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Year of Publication 30.03.2011
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Process of imaging a photoresist with multiple antireflective coatings
Abdallah, David J, Neisser, Mark O, Dammel, Ralph R, Pawlowski, Georg, Biafore, John, Romano, Andrew R
Year of Publication 19.10.2010
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Year of Publication 19.10.2010
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Process of imaging a photoresist with multiple antireflective coatings
DAMMEL RALPH R, ROMANO ANDREW R, ABDALLAH DAVID J, PAWLOWSKI GEORG, BIAFORE JOHN, NEISSER MARK O
Year of Publication 19.10.2010
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Year of Publication 19.10.2010
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A HARDMASK PROCESS FOR FORMING A REVERSE TONE IMAGE USING POLYSILAZANE
ABDALLAH, DAVID, J, TAKANO, YUSUKE, KUROSAWA, KAZUNORI, DAMMEL, RALPH, R, LI, JIN
Year of Publication 19.08.2010
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Year of Publication 19.08.2010
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Hardmask Process for Forming a Reverse Tone Image Using Polysilazane
DAMMEL RALPH R, TAKANO YUSUKE, LI JIN, KUROSAWA KAZUNORI, ABDALLAH DAVID
Year of Publication 12.08.2010
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Year of Publication 12.08.2010
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