Analog reservoir computing via ferroelectric mixed phase boundary transistors
Kim, Jangsaeng, Park, Eun Chan, Shin, Wonjun, Koo, Ryun-Han, Han, Chang-Hyeon, Kang, He Young, Yang, Tae Gyu, Goh, Youngin, Lee, Kilho, Ha, Daewon, Cheema, Suraj S., Jeong, Jae Kyeong, Kwon, Daewoong
Published in Nature communications (23.10.2024)
Published in Nature communications (23.10.2024)
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Journal Article
Device modeling of two-steps oxygen anneal-based submicron InGaZnO back-end-of-line field-effect transistor enabling short-channel effects suppression
Kim, Donguk, Kim, Je-Hyuk, Choi, Woo Sik, Yang, Tae Jun, Jang, Jun Tae, Belmonte, Attilio, Rassoul, Nouredine, Subhechha, Subhali, Delhougne, Romain, Kar, Gouri Sankar, Lee, Wonsok, Cho, Min Hee, Ha, Daewon, Kim, Dae Hwan
Published in Scientific reports (12.11.2022)
Published in Scientific reports (12.11.2022)
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Journal Article
Highly manufacturable 7nm FinFET technology featuring EUV lithography for low power and high performance applications
Daewon Ha, Yang, C., Lee, J., Lee, S., Lee, S. H., Seo, K.-I, Oh, H. S., Hwang, E. C., Do, S. W., Park, S. C., Sun, M.-C, Kim, D. H., Lee, J. H., Kang, M. I., Ha, S.-S, Choi, D. Y., Jun, H., Shin, H. J., Kim, Y. J., Moon, C. W., Cho, Y. W., Park, S. H., Son, Y., Park, J. Y., Lee, B. C., Kim, C., Oh, Y. M., Park, J. S., Kim, S. S., Kim, M. C., Hwang, K. H., Nam, S. W., Maeda, S., Kim, D.-W, Lee, J.-H, Liang, M. S., Jung, E. S.
Published in 2017 Symposium on VLSI Technology (01.06.2017)
Published in 2017 Symposium on VLSI Technology (01.06.2017)
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Conference Proceeding
Extremely scaled silicon nano-CMOS devices
Chang, L., Yang-kyu Choi, Ha, D., Ranade, P., Shiying Xiong, Bokor, J., Chenming Hu, King, T.J.
Published in Proceedings of the IEEE (01.11.2003)
Published in Proceedings of the IEEE (01.11.2003)
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Journal Article
Molybdenum gate technology for ultrathin-body MOSFETs and FinFETs
Daewon Ha, Takeuchi, H., Yang-Kyu Choi, Tsu-Jae King
Published in IEEE transactions on electron devices (01.12.2004)
Published in IEEE transactions on electron devices (01.12.2004)
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Journal Article
Investigation of Gate-Induced Drain Leakage (GIDL) Current in Thin Body Devices: Single-Gate Ultra-Thin Body, Symmetrical Double-Gate, and Asymmetrical Double-Gate MOSFETs
Choi, Yang-Kyu, Ha, Daewon, King, Tsu-Jae, Bokor, Jeffrey
Published in Japanese Journal of Applied Physics (2003)
Published in Japanese Journal of Applied Physics (2003)
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Journal Article
Hydrogen annealing effect on DC and low-frequency noise characteristics in CMOS FinFETs
Jeong-Soo Lee, Yang-Kyu Choi, Daewon Ha, Balasubramanian, S., Tsu-Jae King, Bokor, J.
Published in IEEE electron device letters (01.03.2003)
Published in IEEE electron device letters (01.03.2003)
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Journal Article
Progress, Challenges, and Opportunities in Oxide Semiconductor Devices: A Key Building Block for Applications Ranging from Display Backplanes to 3D Integrated Semiconductor Chips
Kim, Taikyu, Choi, Cheol Hee, Hur, Jae Seok, Ha, Daewon, Kuh, Bong Jin, Kim, Yongsung, Cho, Min Hee, Kim, Sangwook, Jeong, Jae Kyeong
Published in Advanced materials (Weinheim) (01.10.2023)
Published in Advanced materials (Weinheim) (01.10.2023)
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Journal Article
Nanoscale ultrathin body PMOSFETs with raised selective germanium source/drain
Choi, Yang-Kyu, Ha, Daewon, King, Tsu-Jae, Hu, Chenming
Published in IEEE electron device letters (01.09.2001)
Published in IEEE electron device letters (01.09.2001)
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Journal Article
Design Guidelines of Multibridge Channel-Ferroelectric FET for 3-nm Node and Beyond
Lee, Kynghwan, Hong, Jungpyo, Kuh, Bong Jin, Ha, Daewon, Hyun, Sangjin, Ahn, Sujin, Song, Jaihyuk
Published in IEEE transactions on electron devices (01.11.2024)
Published in IEEE transactions on electron devices (01.11.2024)
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Journal Article
A Comprehensive Study of Transient Characteristics in FeFET Using In-Situ V t Measurement Method
Myeong, Ilho, Kim, Hyoseok, Kim, Wanki, Ha, Daewon, Ahn, Sujin, Song, Jaihyuk
Published in IEEE electron device letters (01.08.2024)
Published in IEEE electron device letters (01.08.2024)
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Journal Article
A Comprehensive Study of Transient Characteristics in FeFET Using In-Situ Vt Measurement Method
Myeong, Ilho, Kim, Hyoseok, Kim, Wanki, Ha, Daewon, Ahn, Sujin, Song, Jaihyuk
Published in IEEE electron device letters (01.08.2024)
Published in IEEE electron device letters (01.08.2024)
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Journal Article
Revival of Ferroelectric Memories Based on Emerging Fluorite-Structured Ferroelectrics
Park, Ju Yong, Choe, Duk-Hyun, Lee, Dong Hyun, Yu, Geun Taek, Yang, Kun, Kim, Se Hyun, Park, Geun Hyeong, Nam, Seung-Geol, Lee, Hyun Jae, Jo, Sanghyun, Kuh, Bong Jin, Ha, Daewon, Kim, Yongsung, Heo, Jinseong, Park, Min Hyuk
Published in Advanced materials (Weinheim) (01.10.2023)
Published in Advanced materials (Weinheim) (01.10.2023)
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Journal Article
Understanding the Memory Window of Ferroelectric FET and Demonstration of 4.8-V Memory Window With 20-nm HfO2
Qin, Yixin, Zhao, Zijian, Lim, Suhwan, Kim, Kijoon, Kim, Kwangsoo, Kim, Wanki, Ha, Daewon, Narayanan, Vijaykrishnan, Ni, Kai
Published in IEEE transactions on electron devices (01.08.2024)
Published in IEEE transactions on electron devices (01.08.2024)
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Journal Article
Understanding the Memory Window of Ferroelectric FET and Demonstration of 4.8-V Memory Window With 20-nm HfO 2
Qin, Yixin, Zhao, Zijian, Lim, Suhwan, Kim, Kijoon, Kim, Kwangsoo, Kim, Wanki, Ha, Daewon, Narayanan, Vijaykrishnan, Ni, Kai
Published in IEEE transactions on electron devices (01.08.2024)
Published in IEEE transactions on electron devices (01.08.2024)
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Journal Article
Strategies for a Wide Memory Window of Ferroelectric FET for Multilevel Ferroelectric VNAND Operation
Myeong, Ilho, Kim, Hyoseok, Kim, Seunghyun, Lim, Suhwan, Kim, Kwangsu, Kim, Wanki, Ha, Daewon, Ahn, Sujin, Song, Jaihyuk
Published in IEEE electron device letters (01.07.2024)
Published in IEEE electron device letters (01.07.2024)
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Journal Article
Anomalous junction leakage current induced by STI dislocations and its impact on dynamic random access memory devices
Ha, Daewon, Cho, Changhyun, Shin, Dongwon, Koh, Gwan-Hyeob, Chung, Tae-Young, Kim, Kinam
Published in IEEE transactions on electron devices (01.05.1999)
Published in IEEE transactions on electron devices (01.05.1999)
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Journal Article
A Large Window Nonvolatile Transistor Memory for High-Density and Low-Power Vertical NAND Storage Enabled by Ferroelectric Charge Pumping
Zhao, Zijian, Qin, Yixin, Duan, Jiahui, Lee, YuShan, Lim, Suhwan, Kim, Kijoon, Kim, Kwangsoo, Kim, Wanki, Ha, Daewon, Narayanan, Vijaykrishnan, Ni, Kai
Published in IEEE electron device letters (09.10.2024)
Published in IEEE electron device letters (09.10.2024)
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