Germanium p-Channel FinFET Fabricated by Aspect Ratio Trapping
van Dal, Mark J. H., Vellianitis, Georgios, Duriez, Blandine, Doornbos, Gerben, Chih-Hua Hsieh, Bi-Hui Lee, Kai-Min Yin, Passlack, Matthias, Diaz, Carlos H.
Published in IEEE transactions on electron devices (01.02.2014)
Published in IEEE transactions on electron devices (01.02.2014)
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Journal Article
Germanium n-Channel Planar FET and FinFET: Gate-Stack and Contact Optimization
van Dal, Mark J. H., Duriez, Blandine, Vellianitis, Georgios, Doornbos, Gerben, Passlack, Matthias, Yee-Chia Yeo, Diaz, Carlos H.
Published in IEEE transactions on electron devices (01.11.2015)
Published in IEEE transactions on electron devices (01.11.2015)
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Journal Article
High-Performance InAs Gate-All-Around Nanowire MOSFETs on 300 mm Si Substrates
Doornbos, Gerben, Holland, Martin, Vellianitis, Georgios, Van Dal, Mark J. H., Duriez, Blandine, Oxland, Richard, Afzalian, Aryan, Ta-Kun Chen, Hsieh, Gordon, Passlack, Matthias, Yee-Chia Yeo
Published in IEEE journal of the Electron Devices Society (01.09.2016)
Published in IEEE journal of the Electron Devices Society (01.09.2016)
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Journal Article
Material Aspects and Challenges for SOI FinFET Integration
Van Dal, Mark J., Vellianitis, Georgios, Duffy, Ray, Doornbos, Gerben, Pawlak, Bartek, Duriez, Blandine, Lai, Lhi-Shue, Hikavyy, Andriy Y., Vandeweyer, Tom, Demand, Marc, Altamirano, Efrain, Rooyackers, Rita, Witters, Liesbeth, Collaert, Nadine, Jurczak, Malgorzata, Kaiser, Monja, Weemaes, Robbert G., Lander, Rob
Published in ECS transactions (24.10.2008)
Published in ECS transactions (24.10.2008)
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Journal Article
Experimental Analysis and Modeling of Self-Heating and Thermal Coupling in 28 nm FD-SOI CMOS Transistors Down to Cryogenic Temperatures
Bergamaschi, Flavio Enrico, Frutuoso, Tadeu Mota, Paz, Bruna Cardoso, Billiot, Gerard, Jansen, Aloysius G. M., Galy, Phillipe, Vincent, Emmanuel, Gaillard, Fred, Duriez, Blandine, Casse, Mikael
Published in IEEE transactions on electron devices (01.04.2024)
Published in IEEE transactions on electron devices (01.04.2024)
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Journal Article
Advanced SiGe:B Raised Sources and Drains for p-type FD-SOI MOSFETs
Hartmann, Jean-Michel, Aussenac, Francois, Glorieux, Olivier, Cooper, David, Kerdilès, Sebastien, Chalupa, Zdenek, Boulard, Francois, Niebojewski, Heimanu, Duriez, Blandine, Bordignon, Thomas, Peru, Sebastien, Michałowski, Pawel, Daubriac, Richard, Cristiano, Fuccio
Published in ECS transactions (27.09.2024)
Published in ECS transactions (27.09.2024)
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Journal Article
Computational model for predicting structural stability and stress transfer of a new SiGe stressor technique for NMOS devices
Bordignon, Thomas, Duriez, Blandine, Guitard, Nicolas, Duru, Romain, Pribat, Clément, Richy, Jérôme, Reboh, Shay, Dhar, Siddhartha, Monsieur, Frédéric, Fache, Thibaud, Chalupa, Zdenek, Hartmann, Jean-Michel, Chevalier, Pascal, Roelens, Yannick, Danneville, François, Crémer, Sébastien
Published in Solid-state electronics (01.12.2023)
Published in Solid-state electronics (01.12.2023)
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Journal Article
SEMICONDUCTOR DEVICE AND METHOD
DURIEZ BLANDINE, VAN DAL MARCUS JOHANNES HENRICUS, OKUNO YASUTOSHI, HOLLAND MARTIN CHRISTOPHER
Year of Publication 06.01.2023
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Year of Publication 06.01.2023
Patent
Optimizing RFSOI Performance through a T-shaped Gate and Nano-Second Laser Annealing Techniques
Lucci, L., Cremer, S., Duriez, B., Fache, T., Kerdiles, S., Morand, Y., Hartmann, J.-M., Azevedo-Goncalves, J., Gaillard, F., Chevalier, P.
Published in 2023 IEEE Radio Frequency Integrated Circuits Symposium (RFIC) (11.06.2023)
Published in 2023 IEEE Radio Frequency Integrated Circuits Symposium (RFIC) (11.06.2023)
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Conference Proceeding
SEMICONDUCTOR DEVICE AND METHOD
DURIEZ BLANDINE, VAN DAL MARCUS JOHANNES HENRICUS, OKUNO YASUTOSHI, HOLLAND MARTIN CHRISTOPHER
Year of Publication 11.03.2021
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Year of Publication 11.03.2021
Patent
Atomically flat and uniform relaxed III–V epitaxial films on silicon substrate for heterogeneous and hybrid integration
Holland, Martin, van Dal, Mark, Duriez, Blandine, Oxland, Richard, Vellianitis, Georgios, Doornbos, Gerben, Afzalian, Aryan, Chen, Ta-Kun, Hsieh, Chih-Hua, Ramvall, Peter, Vasen, Tim, Yeo, Yee-Chia, Passlack, Matthias
Published in Scientific reports (07.11.2017)
Published in Scientific reports (07.11.2017)
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Journal Article
A Methodology to Address RF Aging of 40nm CMOS PA Cells Under 5G mmW Modulation Profiles
Divay, A., Dehos, C., Charlet, I., Gaillard, F., Duriez, B., Garros, X., Antonijevic, J., Hai, J., Revil, N., Forest, J., Knopik, V., Cacho, F., Roy, D., Federspiel, X., Cremer, S., Chevalier, P.
Published in 2024 IEEE International Reliability Physics Symposium (IRPS) (14.04.2024)
Published in 2024 IEEE International Reliability Physics Symposium (IRPS) (14.04.2024)
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Conference Proceeding
Unexpected mobility degradation for very short devices : A new challenge for CMOS scaling
Cros, A., Romanjek, K., Fleury, D., Harrison, S., Cerutti, R., Coronel, P., Dumont, B., Pouydebasque, A., Wacquez, R., Duriez, B., Gwoziecki, R., Boeuf, F., Brut, H., Ghibaudo, G., Skotnicki, T.
Published in 2006 International Electron Devices Meeting (2006)
Published in 2006 International Electron Devices Meeting (2006)
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Conference Proceeding