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Year of Publication 17.10.2012
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Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
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Year of Publication 21.10.2011
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Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
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Year of Publication 04.09.2008
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Year of Publication 16.10.2012
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Method and apparatus for refurbishing gas distribution plate surfaces
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Year of Publication 18.12.2013
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Ceramic coating comprising yttrium which is resistant to a reducing plasma
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Year of Publication 01.06.2011
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Erosion resistant yttrium comprising metal with oxidized coating for plasma chamber components
XU, LI, COLLINS, KENNETH S, DUAN, REN-GUAN, SUN, JENNIFER Y, GRAVES, THOMAS, THACH, SENH
Year of Publication 16.11.2009
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Year of Publication 16.11.2009
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Plasma-resistant ceramics with controlled electrical resistivity
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Year of Publication 16.02.2009
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Method of coating semiconductor processing apparatus with protective yttrium-containing coatings
XU LI, YUAN JIE, HE XIAOMING, DUAN REN-GUAN, GRAVES THOMAS, COLLINS KENNETH S, THACH SENH, DEMPSTER JIM, SUN JENNIFER Y
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Year of Publication 07.07.2010
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Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
YUAN, JIE, XU, LI, COLLINS, KENNETH S, DUAN, REN-GUAN, SUN, JENNIFER Y
Year of Publication 01.11.2008
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Year of Publication 01.11.2008
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Ceramic coating comprising yttrium which is resistant to a reducing plasma
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Year of Publication 16.11.2009
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Year of Publication 26.01.2011
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