Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing
Skorupa, Wolfgang, Gebel, Thoralf, Yankov, Rossen A, Paul, Silke, Lerch, Wilfried, Downey, Daniel F, Arevalo, Edwin A
Published in Journal of the Electrochemical Society (01.01.2005)
Published in Journal of the Electrochemical Society (01.01.2005)
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Ultra-shallow junctions produced by plasma doping and flash lamp annealing
Skorupa, Wolfgang, Yankov, Rossen A., Anwand, Wolfgang, Voelskow, Matthias, Gebel, Thoralf, Downey, Daniel F., Arevalo, Edwin A.
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.12.2004)
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15.12.2004)
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Effects of “fast” rapid thermal anneals on sub-keV boron and BF2 ion implants
Downey, Daniel F., Falk, Scott W., Bertuch, Adam F., Marcus, Steven D.
Published in Journal of electronic materials (01.12.1999)
Published in Journal of electronic materials (01.12.1999)
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Tuning for optimal performance in angle control, uniformity, and energy purity
Liebert, Reuel B., Olson, Joseph C., Arevalo, Edwin A., Downey, Daniel F.
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.08.2005)
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01.08.2005)
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Foreword
Ravindra, N. M., Downey, Daniel F., Marcus, Steven D., Sopori, B. L.
Published in Journal of electronic materials (01.12.1999)
Published in Journal of electronic materials (01.12.1999)
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Journal Article
Foreword
Ravindra, N M, Downey, Daniel F, Marcus, Steven D, Sopori, B L
Published in Journal of electronic materials (01.12.1999)
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Published in Journal of electronic materials (01.12.1999)
Journal Article
Effects of `fast' rapid thermal anneals on sub-keV boron and BF sub(2) ion implants
Downey, Daniel F, Falk, Scott W, Bertuch, Adam F, Marcus, Steven D
Published in Journal of electronic materials (01.12.1999)
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Published in Journal of electronic materials (01.12.1999)
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Ultrashallow junction formation by ion implant and RTA
Downey, Daniel F, Osburn, Carlton M, Marcus, Steven D
Published in Solid state technology (01.12.1997)
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Published in Solid state technology (01.12.1997)
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