Spatially Controlled Fabrication of Nanoporous Block Copolymers
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Published in Chemistry of materials (05.10.2004)
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Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones
Bae, Young C, Douki, Katsuji, Yu, Tianyue, Dai, Junyan, Schmaljohann, Dirk, Koerner, Hilmar, Ober, Christopher K, Conley, Will
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New Strategies for High Resolution Photoresists
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Published in Journal of Photopolymer Science and Technology (01.01.2002)
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Lithographic Patterning with Block Copolymers
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Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Strategies for High Transparency Acrylate Resists for 157 nm Lithography
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Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Rejuvenation of 248nm Resist Backbones for 157nm Lithography
Bae, Young C., Douki, Katsuji, Yu, Tianyue, Dai, Junyan, Schmaljohann, Dirk, Kang, Seok Ho, Kim, Keon Hyeong, Koerner, Hilmar, Conley, Will, Miller, Daniel, Balasubramanian, Raghu, Holl, Susan, Ober, Christopher K.
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Additive-Driven Phase-Selective Chemistry in Block Copolymer Thin Films: The Convergence of Top-Down and Bottom-Up Approaches
Du, P., Li, M., Douki, K., Li, X., Garcia, C. B. W., Jain, A., Smilgies, D.-M., Fetters, L. J., Gruner, S. M., Wiesner, U., Ober, C. K.
Published in Advanced materials (Weinheim) (17.06.2004)
Published in Advanced materials (Weinheim) (17.06.2004)
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Radiation-Sensitive Resin Composition
SHIMOKAWA TSUTOMU, ISHII HIROYUKI, DOUKI KATSUJI, KAJITA TORU, MURATA KIYOSHI
Year of Publication 15.06.2001
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Year of Publication 15.06.2001
Patent
Synthesis and spectroscopic and electrical properties of [W(C3S5)3]2- and [Mo(C3S5)3]2- anion complexes and their oxidized species and x-ray crystal structures of [NBun4]2[W(C3S5)3], [NBun4]2[Mo(C3S5)3], and [Fe(C5Me5)2][W(C3S5)3]
Matsubayashi, Genetsu, Douki, Katsuji, Tamura, Hatsue, Nakano, Motohiro, Mori, Wasuke
Published in Inorganic chemistry (01.12.1993)
Published in Inorganic chemistry (01.12.1993)
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Radiation-sensitive resin composition
SHIMOKAWA, TSUTOMU, DOUKI, KATSUJI, KAJITA, TORU, MURATA, KIYOSHI, ISHII, HIROYUKI
Year of Publication 01.02.2007
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Year of Publication 01.02.2007
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Radiation-sensitive resin composition
SHIMOKAWA TSUTOMU, ISHII HIROYUKI, DOUKI KATSUJI, KAJITA TORU, MURATA KIYOSHI
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Year of Publication 30.10.2006
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Strahlungsempfindliche Harzzusammensetzung
SHIMOKAWA, TSUTOMU, DOUKI, KATSUJI, MURATA, KIYOSHI, KAJITA, TORU, ISHII, HIROYUKI
Year of Publication 17.08.2006
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Year of Publication 17.08.2006
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STRAHLUNGSEMPFINDLICHE HARZZUSAMMENSETZUNG
SHIMOKAWA, TSUTOMU, DOUKI, KATSUJI, MURATA, KIYOSHI, KAJITA, TORU, ISHII, HIROYUKI
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Year of Publication 15.02.2006
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Radiation-sensitive resin composition
SHIMOKAWA, TSUTOMU, DOUKI, KATSUJI, MURATA, KIYOSHI, KAJITA, TORU, ISHII, HIROYUKI
Year of Publication 04.01.2006
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Year of Publication 04.01.2006
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