Platform-Dependent Properties of 193nm Single Layer Resists
Allen, Robert D., Wallow, Thomas I., Opitz, Juliann, Larson, Carl, DiPietro, Richard A., Sooriyakumaran, Ratnam, Brock, Philip, Breyta, Greg, Hofer, Donald C., Jayaraman, Saikumar, Vicari, Richard, Hullihen, Karen A., Rhodes, Larry F., Goodall, Brian L., Shick, Robert A.
Published in Journal of Photopolymer Science and Technology (1998)
Published in Journal of Photopolymer Science and Technology (1998)
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Journal Article
193nm Photoresist R&D The Risk & Challenge
Hofer, Donald C., Allen, Robert, Wallraff, Greg, Ito, Hiroshi, Breyta, Greg, Brock, Phil, DiPietro, Rick, Conley, Will
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
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Journal Article
The Lithographic Performance and Contamination Resistance of a New Family of Chemically Amplified DUV Photoresists
Breyta, Greg, Hofer, Donald C., Ito, Hiroshi, Seeger, Dave, Petrillo, Karen, Moritz, Holger, Fischer, Thomas
Published in Journal of Photopolymer Science and Technology (1994)
Published in Journal of Photopolymer Science and Technology (1994)
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Journal Article
The Influence of Photoacid Structure on the Design and Performance of 193-nm Resists
Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, Sooriyakumaran, Ratnam, Hofer, Donald C.
Published in Journal of Photopolymer Science and Technology (1997)
Published in Journal of Photopolymer Science and Technology (1997)
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Journal Article
The Influence of Photoacid Structure on the Design and Performance of 1 93-nm Resists
Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, Sooriyakumaran, Ratnam, Hofer, Donald C.
Published in Journal of photopolymer science and technology (1997)
Published in Journal of photopolymer science and technology (1997)
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Journal Article
Photoresists for 193-nm lithography
Allen, Robert D, Wallraff, Gregory M, Hofer, Donald C, Kunz, Roderick R
Published in IBM journal of research and development (01.01.1997)
Published in IBM journal of research and development (01.01.1997)
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Journal Article
Synthesis and characterization of phenylquinoxaline-arylene ester block copolymers
LABADIE, J. W, HEDRICK, J. L, HOFER, D. C
Published in Polymer bulletin (Berlin, Germany) (01.11.1987)
Published in Polymer bulletin (Berlin, Germany) (01.11.1987)
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Journal Article
Solid state properties of phenylquinoxaline-arylene ester copolymers
HEDRICK, J. L, LABADIE, J. W, HOFER, D. C
Published in Polymer bulletin (Berlin, Germany) (01.11.1987)
Published in Polymer bulletin (Berlin, Germany) (01.11.1987)
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Journal Article