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"DOBASHI TORU"
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TREATMENT LIQUID AND PATTERN FORMATION METHOD
by
TAKAHASHI TOMOMI
,
DOBASHI TORU
Year of Publication
05.03.2024
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SUBSTRATE PROCESSING METHOD
by
NARITA MOE
,
DOBASHI TORU
,
SUGIMURA NOBUAKI
Year of Publication
07.06.2023
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MASK BLANK COATED WITH RESIST, PHOTOMASK, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE USING THE SAME
by
TSUCHIMURA TOMOTAKA
,
YAMAGUCHI SHUHEI
,
DOBASHI TORU
Year of Publication
23.10.2014
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METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN, CROSSLINKABLE NEGATIVE RESIST COMPOSITION, MOLD FOR NANO-IMPRINT, AND PHOTOMASK
by
DOBASHI TORU
Year of Publication
04.03.2013
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ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND RESIST FILM USING THE SAME
by
DOBASHI TORU
Year of Publication
11.08.2011
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POSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
by
DOBASHI TORU
Year of Publication
22.10.2009
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POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING SAME
by
DOBASHI TORU
Year of Publication
14.05.2009
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METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN, POSITIVE RESIST COMPOSITION, MOLD FOR NANO-IMPRINT, AND PHOTOMASK
by
SHIBATA MICHIHIRO
,
DOBASHI TORU
Year of Publication
04.03.2013
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METHOD FOR FORMING RESIST PATTERN, RESIST PATTERN, CROSSLINKABLE NEGATIVE TYPE CHEMICALLY AMPLIFIED RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, MOLD FOR NANOIMPRINT, AND PHOTOMASK
by
SHIBATA MICHIHIRO
,
DOBASHI TORU
Year of Publication
28.02.2013
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RESIST PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING PATTERNED SUBSTRATE USING THE SAME
by
USA TOSHIHIRO
,
DOBASHI TORU
Year of Publication
25.10.2012
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ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS
by
TSUBAKI HIDEAKI
,
SHIRAKAWA KOJI
,
DOBASHI TORU
Year of Publication
01.05.2014
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RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
by
DOBASHI TORU
,
MIZUTANI KAZUYOSHI
Year of Publication
15.10.2009
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METHOD FOR DEVELOPING RESIST, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING MOLD, AND DEVELOPING SOLUTION USED FOR THE SAME
by
SEKI TOMOKAZU
,
TAKANO YUKIO
,
DOBASHI TORU
Year of Publication
10.10.2013
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AGENT FOR IMPROVING PROCESSABILITY AND THERMOPLASTIC RESIN COMPOSITION
by
DOBASHI TORU
,
ITO KOICHI
Year of Publication
19.10.2006
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ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE SAME, AND PATTERN FORMING METHOD
by
KAWABATA KENJI
,
TSUCHIMURA TOMOTAKA
,
INAZAKI TAKESHI
,
DOBASHI TORU
Year of Publication
17.10.2013
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METHOD OF FORMING PATTERN, PHOTOMASK AND NANOIMPRINT MOLD MASTER
by
USA TOSHIHIRO
,
SEKI TOMOKAZU
,
TAKANO YUKIO
,
DOBASHI TORU
Year of Publication
07.10.2013
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POLYCARBONATE RESIN COMPOSITION
by
DOBASHI TORU
,
OSUGA MASAHIRO
Year of Publication
22.09.2005
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PROCESSING AID FOR EXPANSION MOLDING, VINYL CHLORIDE RESIN COMPOSITION FOR EXPANSION MOLDING, AND EXPANSION-MOLDED PRODUCT
by
DOBASHI TORU
,
OSUGA MASAHIRO
Year of Publication
22.09.2005
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RESIST PATTERN FORMING METHOD AND DEVELOPER USED FOR THE METHOD
by
TSUBAKI HIDEAKI
,
DOBASHI TORU
,
YAO TADATERU
Year of Publication
31.03.2011
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ORGANIC SOLVENT BASED DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAM OR EUV RAY
by
TSUBAKI HIDEAKI
,
SHIRAKAWA KOJI
,
DOBASHI TORU
Year of Publication
30.09.2010
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