Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unit
Schumacher, Marcus, Baumann, Peter, Lindner, Johannes, Deschler, Marc
Year of Publication 12.08.2008
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Year of Publication 12.08.2008
Patent
METHOD AND DEVICE FOR DEPOSITING SINGLE COMPONENT OR MULTICOMPONENT LAYERS AND SERIES OF LAYERS USING NON-CONTINUOUS INJECTION OF LIQUID AND DISSOLVED STARTING MATERIAL BY A MULTI-CHANNEL INJECTION UNIT
LINDNER, JOHANNES, DESCHLER, MARC, SCHUMACHER, MARCUS, BAUMANN, PETER
Year of Publication 07.06.2006
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Year of Publication 07.06.2006
Patent
TWI368668B
LINDNER, JOHANNES, DESCHLER, MARC, SCHUMACHER, MARKUS, BAUMANN, PETER
Year of Publication 21.07.2012
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Year of Publication 21.07.2012
Patent
CVD reactor having temperature-controlled fluid inlet unit
KAEPPELER, JOHANNES, STRAUCH, GERD, DESCHLER, MARC, JUERGENSEN, HOLGER, SCHUMACHER, MARKUS
Year of Publication 07.10.1999
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Year of Publication 07.10.1999
Patent
Planar monolithic integration of LED and FET devices on a conductive substrate
Deschler, M., Heyen, M., Roentgen, P., Narozny, P., Beneking, H., Balk, P.
Published in IEEE transactions on electron devices (01.10.1987)
Published in IEEE transactions on electron devices (01.10.1987)
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Journal Article
CVD reactor
K PPELER JOHANNES, STRAUCH GERD, J RGENSEN HOLGER, DESCHLER MARC, SCHUMACHER MARKUS
Year of Publication 30.10.2001
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Year of Publication 30.10.2001
Patent