Search Results - "DENGEL GUENTHER" :: K.UTB vyhledávací portál

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OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY

by EHM DIRK HEINRICH, SCHMIDT STEFAN WOLFGANG, DENGEL GUENTHER
Year of Publication 30.05.2012

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ILLUMINATING OPTIC FOR EUV MICROLITHOGRAPHY

by ENDRES MARTIN, OSSMANN JENS, DINGER UDO, WARM BERNDT, WITTICH GERO, DENGEL GUENTHER, STUETZLE RALF
Year of Publication 23.06.2011

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Method and cooling system for cooling an optical element for EUV applications

by Dengel Guenther, Hartjes Joachim
Year of Publication 06.06.2017

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METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV APPLICATIONS

by HARTJES JOACHIM, DENGEL GUENTHER
Year of Publication 16.04.2015

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Microlithography illumination systems, components and methods

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 04.02.2014

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METHOD AND COOLING SYSTEM FOR COOLING AN OPTICAL ELEMENT FOR EUV APPLICATIONS

by DENGEL, GUENTHER, HARTJES, JOACHIM
Year of Publication 03.01.2014

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Facet mirror comprising a multiplicity of mirror segments

by DENGEL GUENTHER
Year of Publication 30.10.2008

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Facet mirror e.g. field facet mirror, for projection illumination system, has mirror segments provided with reflective surfaces, arranged on mirror carrier, and formed with individually formed angle of inclination in two different planes

by DENGEL, GUENTHER
Year of Publication 25.10.2007

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MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 20.10.2011

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Microlithography illumination systems, components and methods

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 02.08.2011

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Microlithography illumination systems, components and methods

by Warm, Berndt, Dengel, Guenther
Year of Publication 02.08.2011

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Blocking element for protecting optical elements in projection exposure apparatuses

by Dengel Guenther, Piatkowski Maik-René, Hartjes Joachim, Sitek Bernhard
Year of Publication 20.06.2017

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Illumination optics for projection microlithography

by Warm, Berndt, Dengel, Guenther
Year of Publication 28.12.2010

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Illumination optics for projection microlithography

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 28.12.2010

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Illumination lens for an EUV projection microlithography, projection exposure apparatus and method for manufacturing microstructured component

by DENGEL, GUENTHER, WARM, BERNDT
Year of Publication 15.12.2010

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MICROLITHOGRAPHY ILLUMINATION SYSTEMS, COMPONENTS AND METHODS

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 04.09.2008

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BLOCKING ELEMENT FOR PROTECTING OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES

by HARTJES JOACHIM, PIATKOWSKI MAIK-RENÉ, SITEK BERNHARD, DENGEL GUENTHER
Year of Publication 25.06.2015

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Illumination system for extreme ultraviolet micro lithograph, has illumination optic for guiding illuminating light of radiation source into object field in object plane

by DENGEL, GUENTHER, WARM, BERNDT
Year of Publication 19.06.2008

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ILLUMINATION OPTICS FOR EUV PROJECTION MICROLITHOGRAPHY, ILLUMINATION SYSTEM INCLUDING ILLUMINATION OPTICS, PROJECTION ALIGNER INCLUDING ILLUMINATION SYSTEM, METHOD OF MANUFACTURING MICROSTRUCTURE ELEMENT, AND MICROSTRUCTURE ELEMENT OBTAINED BY ITS METHOD

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 12.06.2008

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ILLUMINATION OPTICS FOR PROJECTION MICROLITHOGRAPHY

by WARM BERNDT, DENGEL GUENTHER
Year of Publication 29.05.2008

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