Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects
Liu, Eric, Hegazy, Amir, Choi, Hyeonseon, Weires, Maximilian, Brainard, Robert, Denbeaux, Gregory
Published in Journal of Photopolymer Science and Technology (01.01.2021)
Published in Journal of Photopolymer Science and Technology (01.01.2021)
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Journal Article
Dry Deposition and Dry Development of Metal Oxide Based Photoresist
Kenane, Nizan, Silva, Anuja De, Haider, Ali, Hoang, Linh, Huang, Ching-Chung, Kam, Benjamin, Kim, Ji Yeon, Lee, Younghee, Li, Da, Tan, Samantha, Weidman, Tim, Wu, Cheng Hao, Yu, Jengyi, Zhang, Guoyan, Zhang, Yichi, Brainard, Robert L., Denbeaux, Gregory, Maldonado, Nicolas, Upadhyay, Nitinkumar S., Sherwood, Mark
Published in Journal of Photopolymer Science and Technology (25.06.2024)
Published in Journal of Photopolymer Science and Technology (25.06.2024)
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Journal Article
Magnetic reversal of ion beam patterned Co/Pt multilayers
Kusinski, Greg J., Krishnan, Kannan M., Denbeaux, Gregory, Thomas, Gareth
Published in Scripta materialia (01.04.2003)
Published in Scripta materialia (01.04.2003)
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Journal Article
Conference Proceeding
Sensor Reliability Assessment Model and Cost Analysis : ER: Equipment Reliability and Productivity Enhancements
Boland, Bridget, Denbeaux, Gregory, Eisenbraun, Eric, Fancher, Michael
Published in 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2019)
Published in 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.05.2019)
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Conference Proceeding
X-ray photoelectron spectroscopy process optimization for characterization of trace contamination elements for extreme ultraviolet resist outgassing study: XPS optimization for EUV resist outgassing study
Upadhyaya, Mihir, Kandel, Yudhishthir, Denbeaux, Gregory, Montgomery, Cecilia, Fan, Yu-Jen
Published in X-ray spectrometry (01.03.2014)
Published in X-ray spectrometry (01.03.2014)
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Journal Article
X-ray photoelectron spectroscopy process optimization for characterization of trace contamination elements for extreme ultraviolet resist outgassing study
Upadhyaya, Mihir, Kandel, Yudhishthir, Denbeaux, Gregory, Montgomery, Cecilia, Fan, Yu-Jen
Published in X-ray spectrometry (01.03.2014)
Published in X-ray spectrometry (01.03.2014)
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Journal Article
High resolution protein localization using soft X‐ray microscopy
Meyer‐Ilse, W., Hamamoto, D., Nair, A., Lelièvre, S. A., Denbeaux, G., Johnson, L., Pearson, A. L., Yager, D., Legros, M. A., Larabell, C. A.
Published in Journal of microscopy (Oxford) (01.03.2001)
Published in Journal of microscopy (Oxford) (01.03.2001)
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Journal Article
EUV Resist Outgassing: How Much is Too Much?
Dean, Kim R., Debeaux, Gregory, Wüest, Andrea, Garg, Rashi
Published in Journal of Photopolymer Science and Technology (2007)
Published in Journal of Photopolymer Science and Technology (2007)
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Journal Article
20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures [corrected]
Chao, Weilun, Anderson, Erik, Denbeaux, Gregory P, Harteneck, Bruce, Liddle, J Alexander, Olynick, Deirdre L, Pearson, Angelic L, Salmassi, Farhad, Song, Cheng Yu, Attwood, David T
Published in Optics letters (01.11.2003)
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Published in Optics letters (01.11.2003)
Journal Article
A full field transmission X-ray microscope as a tool for high-resolution magnetic imaging
Denbeaux, G., Fischer, P., Kusinski, G., Le Gros, M., Pearson, A., Attwood, D.
Published in IEEE transactions on magnetics (01.07.2001)
Published in IEEE transactions on magnetics (01.07.2001)
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Journal Article
Conference Proceeding
Magnetic domains in nanostructured media studied with M-TXM
Fischer, P., Eimüller, T., Schütz, G., Bayreuther, G., Tsunashima, S., Takagi, N., Denbeaux, G., Attwood, D.
Published in Journal of synchrotron radiation (01.03.2001)
Published in Journal of synchrotron radiation (01.03.2001)
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Journal Article