A novel fingered stacked capacitor cell
NGUYEN, T, NGUYEN, S. V, DOBUZINSKY, D. M, CARL, D. A
Published in Journal of the Electrochemical Society (01.07.1995)
Published in Journal of the Electrochemical Society (01.07.1995)
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Journal Article
Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices
Costrini, Gregory, Dobuzinsky, David M, Kanarsky, Thomas S, Naeem, Munir D, Sheraw, Christopher D, Wise, Richard
Year of Publication 18.01.2011
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Year of Publication 18.01.2011
Patent
Method for non-selective shallow trench isolation reactive ion etch for patterning hybrid-oriented devices compatible with high-performance highly-integrated logic devices
COSTRINI GREGORY, DOBUZINSKY DAVID M, KANARSKY THOMAS S, WISE RICHARD, SHERAW CHRISTOPHER D, NAEEM MUNIR D
Year of Publication 18.01.2011
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Year of Publication 18.01.2011
Patent
Poly filled substrate contact on SOI structure
DOBUZINSKY DAVID M, LEOBANDUNG EFFENDI, TESSIER BRIAN L, NAEEM MUNIR D, KIM BYEONG Y
Year of Publication 22.09.2009
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Year of Publication 22.09.2009
Patent
Poly filled substrate contact on SOI structure
Dobuzinsky, David M, Kim, Byeong Y, Leobandung, Effendi, Naeem, Munir D, Tessier, Brian L
Year of Publication 22.09.2009
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Year of Publication 22.09.2009
Patent
METHOD FOR NON-SELECTIVE SHALLOW TRENCH ISOLATION REACTIVE ION ETCH FOR PATTERNING HYBRID-ORIENTED DEVICES COMPATIBLE WITH HIGH-PERFORMANCE HIGHLY-INTEGRATED LOGIC DEVICES
COSTRINI GREGORY, DOBUZINSKY DAVID M, KANARSKY THOMAS S, WISE RICHARD, SHERAW CHRISTOPHER D, NAEEM MUNIR D
Year of Publication 30.07.2009
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Year of Publication 30.07.2009
Patent