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"DASSAPA FRANCOIS C"
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"DASSAPA FRANCOIS C"
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웨이퍼리스 건식 세정 광 방출 분광법을 사용한 건식 에칭 프로세스 특성 제어
by
VEDHACHALAM DEEPAK
,
COPPA BRIAN J
,
DASSAPA FRANCOIS C
Year of Publication
09.11.2018
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Sensitive end-point detection for dielectric etch
by
HUDSON, Eric A
,
DASSAPA
,
Francois C
Published in
Journal of the Electrochemical Society
(2001)
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Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
by
Vedhachalam, Deepak
,
Dassapa
,
Francois C
,
Coppa, Brian J
Year of Publication
15.03.2022
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
Vedhachalam, Deepak
,
Dassapa
,
Francois C
,
COPPA, Brian J
Year of Publication
31.12.2020
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Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
by
Vedhachalam, Deepak
,
Dassapa
,
Francois C
,
Coppa, Brian J
Year of Publication
15.09.2020
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
VEDHACHALAM, Deepak
,
DASSAPA
,
Francois C
,
COPPA, Brian J
Year of Publication
30.10.2018
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
Dassapa Francois C
,
Coppa Brian J
,
Vedhachalam Deepak
Year of Publication
05.10.2017
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
VEDHACHALAM, Deepak
,
DASSAPA
,
Francois C
,
COPPA, Brian J
Year of Publication
05.10.2017
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
Dassapa Francois C
,
Coppa Brian J
,
Vedhachalam Deepak
Year of Publication
05.10.2017
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Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
by
VEDHACHALAM, DEEPAK
,
COPPA, BRIAN J
,
DASSAPA
,
FRANCOIS C
Year of Publication
11.04.2019
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CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
by
VEDHACHALAM DEEPAK
,
COPPA BRIAN J
,
DASSAPA FRANCOIS C
Year of Publication
21.12.2018
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Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
by
VEDHACHALAM, DEEPAK
,
COPPA, BRIAN J
,
DASSAPA
,
FRANCOIS C
Year of Publication
01.01.2018
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METHOD AND APPARATUS FOR ETCH ENDPOINT DETECTION
by
MCMILLIN BRIAN K
,
DASSAPA FRANCOIS C
Year of Publication
27.04.2006
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Method of plasma etch endpoint detection using a V-I probe diagnostics
by
AVOYAN ARMEN
,
MCMILLIN BRAIN
,
DASSAPA FRANCOIS C
Year of Publication
06.10.2005
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