A New Etch Planarization Technology to Correct Non-Uniformity Post Chemical Mechanical Polishing
Meihua Shen, Baosuo Zhou, Yifeng Zhou, Hoang, John, Bowers, Jim, Bailey, Andrew D., Pape, Eric, Singh, Harmeet, Wise, Rich, Dasaka, Ravi K.
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
Published in IEEE transactions on semiconductor manufacturing (01.11.2015)
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Journal Article
Etch planarization - A new approach to correct non-uniformity post chemical mechanical polishing
Meihua Shen, Baosuo Zhou, Yifeng Zhou, Hoang, John, Bowers, Jim, Bailey, Andrew, Pape, Eric, Singh, Harmeet, Dasaka, Ravi K., Wise, Rich
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
Published in 25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014) (01.05.2014)
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Conference Proceeding
High selectivity nitride removal process based on selective polymer deposition
Wise, Richard S, Dasaka, Ravi K, Fuller, Nicholas C. M, Nakamura, Masahiro, Engelmann, Sebastian U
Year of Publication 12.05.2020
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Year of Publication 12.05.2020
Patent
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION
Wise, Richard S, Dasaka, Ravi K, Nakamura, Masahiro, Engelmann, Sebastian U, Fuller, Nicholas C.M
Year of Publication 03.10.2019
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Year of Publication 03.10.2019
Patent
High selectivity nitride removal process based on selective polymer deposition
Wise, Richard S, Dasaka, Ravi K, Fuller, Nicholas C. M, Nakamura, Masahiro, Engelmann, Sebastian U
Year of Publication 18.06.2019
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Year of Publication 18.06.2019
Patent
High selectivity nitride removal process based on selective polymer deposition
Wise, Richard S, Dasaka, Ravi K, Fuller, Nicholas C. M, Nakamura, Masahiro, Engelmann, Sebastian U
Year of Publication 23.04.2019
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Year of Publication 23.04.2019
Patent
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION
Dasaka Ravi K, Engelmann Sebastian U, Fuller Nicholas C.M, Nakamura Masahiro, Wise Richard S
Year of Publication 06.07.2017
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Year of Publication 06.07.2017
Patent
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION
Dasaka Ravi K, Engelmann Sebastian U, Fuller Nicholas C.M, Nakamura Masahiro, Wise Richard S
Year of Publication 06.07.2017
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Year of Publication 06.07.2017
Patent
High selectivity nitride removal process based on selective polymer deposition
Dasaka Ravi K, Engelmann Sebastian U, Nakamura Masahiro, Fuller Nicholas C. M, Wise Richard S
Year of Publication 18.04.2017
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Year of Publication 18.04.2017
Patent
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION
Dasaka Ravi K, Engelmann Sebastian U, Fuller Nicholas C.M, Nakamura Masahiro, Wise Richard S
Year of Publication 11.08.2016
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Year of Publication 11.08.2016
Patent
Asymmetric stressor DRAM
ZHANG BIDAN, NARASIMHA SHREESH, PARRIES PAUL C, PEI CHENGWEN, ONISHI KATSUNORI, WANG GENG, NUMMY KAREN A, DASAKA RAVI K, NAYAZ NOEMAUN AHMED
Year of Publication 19.01.2016
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Year of Publication 19.01.2016
Patent
ASYMMETRIC STRESSOR DRAM
ZHANG BIDAN, NARASIMHA SHREESH, PARRIES PAUL C, PEI CHENGWEN, ONISHI KATSUNORI, WANG GENG, NUMMY KAREN A, DASAKA RAVI K, NAYAZ NOEMAUN AHMED
Year of Publication 03.12.2015
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Year of Publication 03.12.2015
Patent