A Novel Resist Freeze Process for Double Imaging
Abdallah, David J., Alemy, Eric, Chakrapani, Srinivasan, Padmanaban, Murirathna, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Possible Origins and Some Methods to Minimize LER
Padmanaban, Murirathna, Rentkiewicz, David, Hong, Chisun, Lee, Dongkwa, Rahman, Dalil, Sakamuri, Raj, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of photopolymer science and technology (2007)
Published in Journal of photopolymer science and technology (2007)
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Journal Article
Responding to the Challenge: Materials Design for Immersion Lithography
Padmanaban, Munirathna, Romano, Andrew, Lin, Guanyang, Chiu, Simon, Timko, Allen, Houlihan, Frank, Rahman, Dalil, Dammel, Ralph R., Turnquest, Karen, Rich, Georgia, Shuetter, Scott D., Shedd, Timonthy A., Nellis, Gregory A.
Published in Journal of Photopolymer Science and Technology (2006)
Published in Journal of Photopolymer Science and Technology (2006)
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Journal Article
기판 위에 편석층을 제조하는 방법, 및 소자를 제조하는 방법
DAMMEL RALPH R, OCYTKO KORNEL, HUDSON DANIEL, MORSE GRAHAM, KUDO TAKANORI, WANG CHANGSHENG, JEFFERY BEN
Year of Publication 14.11.2022
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Year of Publication 14.11.2022
Patent
New Fluorinated Resins for 157 nm Lithography Application
Houlihan, Francis, Romano, Andrew, Rentkiewicz, David, Sakamuri, Raj, Dammel, Ralph R., Conley, Will, Rich, Georgia, Miller, Daniel, Rhodes, Larry, McDaniels, Joe, Chang, Chun
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article
193 nm Resist Line Collapse Study by Modifying the Resist Polymer and Process Conditions with Utilizing FIRM Process
Tanaka, Keiichi, Yamada, Yoshiaki, Masuda, Seiya, Kobayashi, Masakazu, Kim, Woo-Kyu, Anyadiegwu, Clement, Padamanaban, Murirathna, Dammel, Ralph R.
Published in Journal of Photopolymer Science and Technology (01.01.2004)
Published in Journal of Photopolymer Science and Technology (01.01.2004)
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Journal Article
Optimization of 193nm Contact Hole Resists for 100nm Node
Kudo, Takanori, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Lee, Sang-Ho, Masuda, Seiya, McKenzie, Douglas, Rahman, M. Dalil, Romano, Andrew, Padmanaban, Munirathna, Chun, Jun-Sung, Jung, Jae-Chang, Lee, Sung-Koo, Shin, Ki-Soo, Kim, Hyeong-Soo
Published in Journal of Photopolymer Science and Technology (2002)
Published in Journal of Photopolymer Science and Technology (2002)
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Journal Article
A Percolation View of Novolak Dissolution. 3. Dissolution Inhibition
Shih, Hsiao-Yi, Yeh, Tung-Feng, Reiser, Arnost, Dammel, Ralph R, Merrem, Hans J, Pawlowski, Gerhard
Published in Macromolecules (01.06.1994)
Published in Macromolecules (01.06.1994)
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Journal Article
Mechanistic Studies on the CD Degradation of 193nm Resists during SEM Inspection
Kudo, Takanori, Dammel, Ralph R., Bae, Jun-Born, Rahman, M. Dalil, Kim, Woo-Kyu, McKenzie, Douglas, Alemy, Eric L., Ng, Waiman, Padmanaban, Munirathna
Published in Journal of Photopolymer Science and Technology (2001)
Published in Journal of Photopolymer Science and Technology (2001)
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Journal Article
Sensitized Transparent Photobase Additive For 193 nm Lithography
Padmanaban, Munirathna, Bae, Jun-Born, Cook, Michelle, Kim, Woo-Kyu, Klauck-Jacobs, Axel, Kudo, Takanori, Rahman, M. Dalil, Dammel, Ralph R, Byers, Jeffrey D.
Published in Journal of photopolymer science and technology (2000)
Published in Journal of photopolymer science and technology (2000)
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Journal Article
Carborane-Based Photoacid Generators: New Superacids For 193 nm And EUV Lithography
Dammel, Ralph R., Rahman, M. Dalil, McKenzie, Douglas, Rentkiewicz, David, Kudo, Takanori, Padmanaban, Murirathna, Werden, Karl van
Published in Journal of Photopolymer Science and Technology (2007)
Published in Journal of Photopolymer Science and Technology (2007)
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Journal Article