Capacitance profiling in the CIGS solar cells
Ćwil, Michał, Igalson, Małgorzata, Zabierowski, Paweł, Kaufmann, Chrystian A., Neisser, Axel
Published in Thin solid films (31.05.2007)
Published in Thin solid films (31.05.2007)
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Journal Article
Conference Proceeding
RuO2/SiO2/Si and SiO2/porous Si/Si interfaces analysed by SIMS
CWIL, Michal, KONARSKI, Piotr, PAJAK, Michal, BIENIEK, Tomasz, KOSINSKI, Andrzej, KACZOREK, Krzysztof
Published in Applied surface science (30.07.2006)
Published in Applied surface science (30.07.2006)
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Conference Proceeding
Journal Article
Composition and electrical properties of ultra-thin SiOxNy layers formed by rf plasma nitrogen implantation/plasma oxidation processes
Bieniek, Tomasz, B. Beck, Romuald, Jakubowski, Andrzej, Konarski, Piotr, Ćwil, Michał, Hoffmann, Patrick
Published in Journal of Telecommunications and Information Technology (01.06.2023)
Published in Journal of Telecommunications and Information Technology (01.06.2023)
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Journal Article
Applying shallow nitrogen implantation from rf plasma for dual gate oxide technology
Bieniek, Tomasz, B. Beck, Romuald, Jakubowski, Andrzej, Głuszko, Grzegorz, Konarski, Piotr, Ćwil, Michał
Published in Journal of Telecommunications and Information Technology (01.06.2023)
Published in Journal of Telecommunications and Information Technology (01.06.2023)
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Journal Article
The influence of annealing (900◦C) of ultra-thin PECVD silicon oxynitride layers
Mroczyński, Robert, Głuszko, Grzegorz, B. Beck, Romuald, Jakubowski, Andrzej, Ćwil, Michał, Konarski, Piotr, Hoffmann, Patrick, Schmeißer, Dieter
Published in Journal of Telecommunications and Information Technology (01.06.2023)
Published in Journal of Telecommunications and Information Technology (01.06.2023)
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Journal Article
Comparison of composition of ultra-thin silicon oxynitride layers’ fabricated by PECVD and ultrashallow rf plasma ion implantation
Mroczyński, Robert, Bieniek, Tomasz, B. Beck, Romuald, Ćwil, Michał, Konarski, Piotr, Hoffmann, Patrick, Schmeißer, Dieter
Published in Journal of Telecommunications and Information Technology (01.06.2023)
Published in Journal of Telecommunications and Information Technology (01.06.2023)
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Journal Article
Formation of Pedestal Oxynitride Layer by Extremely Shallow Nitrogen Implantation in Planar R.F. Plasma Reactor
Bieniek, Tomasz, Beck, Romuald, Jakubowski, Andrzej, Hoffmann, Patrick, Schmeisser, Dieter, Konarski, Piotr, Cwil, Michal
Published in ECS transactions (07.07.2006)
Published in ECS transactions (07.07.2006)
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Journal Article
Formation of Pedestal Oxynitride Layer by Extremely Shallow Nitrogen Implantation in Planar R.F. Plasma Reactor
Bieniek, Tomasz, Beck, Romuald, Jakubowski, Andrzej, Hoffmann, Patrick, Schmeisser, Dieter, Konarski, Piotr, Cwil, Michal
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
Published in Meeting abstracts (Electrochemical Society) (17.02.2006)
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Journal Article
RuO 2/SiO 2/Si and SiO 2/porous Si/Si interfaces analysed by SIMS
Ćwil, Michał, Konarski, Piotr, Pająk, Michał, Bieniek, Tomasz, Kosiński, Andrzej, Kaczorek, Krzysztof
Published in Applied surface science (30.07.2006)
Published in Applied surface science (30.07.2006)
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Journal Article