Mechanisms of etching and polymerization in radiofrequency discharges of CF4–H2, CF4–C2F4, C2F6–H2, C3F8–H2
d’Agostino, R., Cramarossa, F., Colaprico, V., d’Ettole, R.
Published in Journal of applied physics (01.03.1983)
Published in Journal of applied physics (01.03.1983)
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Journal Article
Deposition of silicon films from SiCl4 glow discharges: A kinetic model of the surface process
Bruno, G., Capezzuto, P., Cicala, G., Cramarossa, F.
Published in Journal of applied physics (01.09.1987)
Published in Journal of applied physics (01.09.1987)
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Journal Article
Mechanism of silicon film deposition in the RF plasma reduction of silicon tetrachloride
BRUNO, G, CAPEZZUTO, P, CICALA, G, CRAMAROSSA, F
Published in Plasma chemistry and plasma processing (01.06.1986)
Published in Plasma chemistry and plasma processing (01.06.1986)
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Journal Article
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
d’Agostino, R., Capezzuto, P., Bruno, G., Cramarossa, F.
Published in Pure and applied chemistry (01.01.1985)
Published in Pure and applied chemistry (01.01.1985)
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Journal Article
Plasma-assisted etching of aluminum in CCl4?Cl2 mixtures
d'Agostino, R., Capezzuto, P., Cramarossa, F., Fracassi, F.
Published in Plasma chemistry and plasma processing (01.12.1989)
Published in Plasma chemistry and plasma processing (01.12.1989)
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Journal Article
Infrared and visible analysis of He-CO and He-CO-O2 radiofrequency discharges
Benedictis, S De, Cramarossa, F, d'Agostino, R
Published in Journal of physics. D, Applied physics (14.03.1985)
Published in Journal of physics. D, Applied physics (14.03.1985)
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Journal Article
Vibrational distributions of CO in N2 cooled radiofrequency post discharges
DE BENEDICTIS, S, CAPITELLI, M, CRAMAROSSA, F, D'AGOSTINO, R, GORSE, C
Published in Chemical physics letters (23.11.1984)
Published in Chemical physics letters (23.11.1984)
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Journal Article
Vibrational kinetics in liquid nitrogen cooled 5% CO-He radio-frequency discharges
De Benedictis, S., Capitelli, M., Cramarossa, F., d'Agostino, R., Gorse, C., Brechignac, Ph
Published in Optics communications (15.08.1983)
Published in Optics communications (15.08.1983)
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Journal Article
Vibrational kinetics in HeCO reacting discharges
De Benedictis, S., Gorse, C., Cacciatore, M., Capitelli, M., Cramarossa, F., D'Agostino, R., Molinari, E.
Published in Chemical physics letters (01.01.1983)
Published in Chemical physics letters (01.01.1983)
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Journal Article
Optical constants of silicon films deposited by the r.f. glow discharge of SiCl4
Augelli, V., Murri, R., Schiavulli, L., Bruno, G., Capezzuto, P., Cramarossa, F., Evangelisti, F., Fortunato, G.
Published in Thin solid films (18.12.1981)
Published in Thin solid films (18.12.1981)
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Journal Article
Structural and some other properties of silicon deposited in an SiCl4H2 r.f. discharge
Iqbal, Z., Capezzuto, P., Braun, M., Oswald, H.R., Vepřek, S., Bruno, G., Cramarossa, F., Stüssi, H., Brunner, J., Schärli, M.
Published in Thin solid films (01.01.1982)
Published in Thin solid films (01.01.1982)
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