High-K Gate Dielectric Structures by Atomic Layer Deposition for the 32nm and Beyond Nodes
Clark, Robert D., Consiglio, Steve, Wajda, Cory, Leusink, Gert, Sugawara, Takuya, Nakabayashi, Hajime, Jagannathan, Hemanth, Edge, Lisa F., Jamison, Paul, Paruchuri, Vamsi, Iijima, Ryosuke, Takayanagi, Mariko, Linder, Barry, Bruley, J, Copel, Matt, Narayanan, Vijay
Published in ECS transactions (03.10.2008)
Published in ECS transactions (03.10.2008)
Get full text
Journal Article
Effect of Al Doping on the Reliability of ALD HfO 2
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (09.08.2014)
Published in ECS transactions (09.08.2014)
Get full text
Journal Article
Cyclic Plasma Treatment during ALD Hf 1-X Zr x O 2 Deposition
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (24.03.2014)
Published in ECS transactions (24.03.2014)
Get full text
Journal Article
Higher-K Formation in Atomic Layer Deposited Hf 1-X Al x O y
Tapily, Kandabara, Consiglio, Steve, Clark, Robert, Vasic, Relja, Wajda, Cory, Jordan-Sweet, Jean, Leusink, Gert, Diebold, A.C
Published in ECS transactions (13.08.2014)
Published in ECS transactions (13.08.2014)
Get full text
Journal Article
Reliability of ALD Hf 1-X Zr x O 2 Deposited by Intermediate Annealing or Intermediate Plasma Treatment
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (31.08.2013)
Published in ECS transactions (31.08.2013)
Get full text
Journal Article
Extension of Far UV spectroscopic ellipsometry studies of High-κ dielectric films to 130 nm
KAMINENI, Vimal K, HILFIKER, James N, FREEOUF, John L, CONSIGLIO, Steve, CLARK, Robert, LEUSINK, Gert J, DIEBOLD, Alain C
Published in Thin solid films (28.02.2011)
Published in Thin solid films (28.02.2011)
Get full text
Conference Proceeding
Journal Article
Higher-K Formation in Atomic Layer Deposited Hf1-XAlxOy
Tapily, Kandabara, Consiglio, Steve, Clark, Robert, Vasic, Relja, Wajda, Cory, Jordan-Sweet, Jean, Leusink, Gert, Diebold, A.C
Published in ECS transactions (13.08.2014)
Published in ECS transactions (13.08.2014)
Get full text
Journal Article
Cyclic Plasma Treatment during ALD Hf1-XZrxO2 Deposition
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (01.01.2014)
Published in ECS transactions (01.01.2014)
Get full text
Journal Article
Effect of Al Doping on the Reliability of ALD HfO2
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in ECS transactions (01.01.2014)
Published in ECS transactions (01.01.2014)
Get full text
Journal Article
(Invited) Passivation Schemes for Ge High-K Metal Gate MOSFETs on Si for VLSI Production
Tapily, Kandabara, Ngai, Tat, Clark, Robert, O'meara, David, Consiglio, Steve, Gaylord, Richard, Wajda, Cory, Veksler, Dmitry, Hobbs, Chris, Matthews, Ken, Gilmer, David, Kirsch, Paul, Leusink, Gert
Published in ECS transactions (24.03.2014)
Published in ECS transactions (24.03.2014)
Get full text
Journal Article
Methodology of ALD HfO 2 High-κ Gate Dielectric Optimization by Cyclic Depositions and Anneals
Jagannathan, Hemanth, Clark, Robert D., Consiglio, Steve, Jamison, Paul, Linder, Barry, Hopstaken, Marinus, Leusink, Gert, Paruchuri, Vamsi, Narayanan, Vijay
Published in ECS transactions (01.10.2010)
Published in ECS transactions (01.10.2010)
Get full text
Journal Article
Optimizing Band-Edge High-κ/Metal Gate n-MOSFETs with ALD Lanthanum Oxide Cap Layers: Oxidant and Positioning Effects
Clark, Robert D., Jagannathan, Hemanth, Consiglio, Steve, Jamison, Paul, Wajda, Cory, Edge, Lisa, Paruchuri, Vamsi, Narayanan, Vijay, Leusink, Gert
Published in ECS transactions (01.01.2010)
Published in ECS transactions (01.01.2010)
Get full text
Journal Article
Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications
Papadatos, Filippos, Consiglio, Steve, Skordas, Spyridon, Eisenbraun, Eric T., Kaloyeros, Alain E., Peck, John, Thompson, David, Hoover, Cynthia
Published in Journal of materials research (01.10.2004)
Published in Journal of materials research (01.10.2004)
Get full text
Journal Article
Thin Film Process Technologies for Continued Scaling
Clark, Robert, Tapily, Kanda, Yu, Kai-Hung, Hakamata, Takahiro, Consiglio, Steve, O'Meara, David, Wajda, Cory, Smith, Jeffrey, Leusink, Gert
Published in 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2018)
Published in 2018 IEEE 2nd Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2018)
Get full text
Conference Proceeding
Electrical properties and TDDB performance of Cu interconnects using ALD Ta(Al)N barrier and Ru liner for 7nm node and beyond
Kikuchi, Yuki, Kawasaki, Hiroaki, Nagai, Hiroyuki, Yu Kai-Hung, Oie, Manabu, Consiglio, Steve, Wajda, Cory, Maekawa, Kaoru, Leusink, Gert
Published in 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) (01.05.2016)
Published in 2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC) (01.05.2016)
Get full text
Conference Proceeding
Journal Article
Effect of Al Doping on the Reliability of ALD HfO 2
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
Published in Meeting abstracts (Electrochemical Society) (05.08.2014)
Get full text
Journal Article
Cyclic Plasma Treatment during ALD Hf 1-X Zr x O 2 Deposition
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in Meeting abstracts (Electrochemical Society) (01.04.2014)
Published in Meeting abstracts (Electrochemical Society) (01.04.2014)
Get full text
Journal Article
Reliability of ALD Hf 1-X Zr x O 2 Deposited By Intermediate Annealing Or Intermediate Plasma Treatment
Bhuyian, Mdnasiruddin, Misra, Durga, Tapily, Kandabara, Clark, Robert, Consiglio, Steve, Wajda, Cory, Nakamura, G., Leusink, Gert
Published in Meeting abstracts (Electrochemical Society) (27.10.2013)
Published in Meeting abstracts (Electrochemical Society) (27.10.2013)
Get full text
Journal Article