Radical diffusion limits to photoinhibited superresolution lithography
FORMAN, Darren L, COLE, Michael C, MCLEOD, Robert R
Published in Physical chemistry chemical physics : PCCP (28.09.2013)
Published in Physical chemistry chemical physics : PCCP (28.09.2013)
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Journal Article
Quantitative modeling of the reaction/diffusion kinetics of two-chemistry diffusive photopolymers
Kowalski, Benjamin A., Urness, Adam C., Baylor, Martha-Elizabeth, Cole, Michael C., Wilson, William L., McLeod, Robert R.
Published in Optical materials express (01.08.2014)
Published in Optical materials express (01.08.2014)
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Journal Article