Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films
Dimitrakellis, P., Kalampounias, A. G., Spiliopoulos, N., Amanatides, E., Mataras, D., Lahootun, V., Coeuret, F., Madec, A.
Published in AIP advances (01.07.2016)
Published in AIP advances (01.07.2016)
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Journal Article
Carbon fibre cloth as an electrode material: electrical conductivity and mass transfer
COEURET, F, VILAR, E. Oliveira, BEZERRA CAVALCANTI, E
Published in Journal of applied electrochemistry (01.10.2002)
Published in Journal of applied electrochemistry (01.10.2002)
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Journal Article
Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD
Rostaing, J.C., Coeuret, F., Drevillon, B., Etemadi, R., Godet, C., Huc, J., Parey, J.Y., Yakovlev, V.A.
Published in Thin solid films (15.12.1993)
Published in Thin solid films (15.12.1993)
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Conference Proceeding
Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor
Rostaing, J.C., Coeuret, F., Pelletier, J., Lagarde, T., Etemadi, R.
Published in Thin solid films (01.12.1995)
Published in Thin solid films (01.12.1995)
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Conference Proceeding
Mass transfer at the wall of a thin channel containing an expanded turbulence promoting structure
LETORD-QUEMERE, M. M, CŒURET, F, LEGRAND, J
Published in Journal of the Electrochemical Society (01.12.1988)
Published in Journal of the Electrochemical Society (01.12.1988)
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