Effect of plasma N2 and thermal NH3 nitridation in HfO2 for ultrathin equivalent oxide thickness
Dai, Min, Wang, Yanfeng, Shepard, Joseph, Liu, Jinping, Brodsky, Maryjane, Siddiqui, Shahab, Ronsheim, Paul, Ioannou, Dimitris P, Reddy, Chandra, Henson, William, Krishnan, Siddarth, Narayanan, Vijay, Chudzik, Michael P
Published in Journal of applied physics (28.01.2013)
Published in Journal of applied physics (28.01.2013)
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Journal Article
Scaling the MOSFET gate dielectric: From high- k to higher- k? (Invited Paper)
Frank, Martin M., Kim, SangBum, Brown, Stephen L., Bruley, John, Copel, Matthew, Hopstaken, Marco, Chudzik, Michael, Narayanan, Vijay
Published in Microelectronic engineering (01.07.2009)
Published in Microelectronic engineering (01.07.2009)
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Journal Article
Conference Proceeding
Titanium Silicide/Titanium Nitride Full Metal Gates for Dual-Channel Gate-First CMOS
Frank, Martin M., Cabral, Cyril, Dechene, Jessica M., Ortolland, Claude, Yu Zhu, Marshall, Eric D., Murray, Conal E., Chudzik, Michael P.
Published in IEEE electron device letters (01.02.2016)
Published in IEEE electron device letters (01.02.2016)
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Journal Article
Synthesis and Characterization of Volatile, Fluorine-Free β-Ketoiminate Lanthanide MOCVD Precursors and Their Implementation in Low-Temperature Growth of Epitaxial CeO2 Buffer Layers for Superconducting Electronics
Edleman, Nikki L, Wang, Anchuan, Belot, John A, Metz, Andrew W, Babcock, Jason R, Kawaoka, Amber M, Ni, Jun, Metz, Matthew V, Flaschenriem, Christine J, Stern, Charlotte L, Liable-Sands, Louise M, Rheingold, Arnold L, Markworth, Paul R, Chang, Robert P. H, Chudzik, Michael P, Kannewurf, Carl R, Marks, Tobin J
Published in Inorganic chemistry (07.10.2002)
Published in Inorganic chemistry (07.10.2002)
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Journal Article
Investigation of an on product high-k/metal metrology methodology using an in-line, high throughput XPS measurement technique
Min Dai, Klare, Mark, Rangarajan, Srinivasan, Chudzik, Michael P, Shepard, Joseph, Tai, Leo, Ronsheim, Paul, Kwan, Mike, Larson, Tom
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.07.2010)
Published in 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (01.07.2010)
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Conference Proceeding
Bulk‐Switching Memristor‐Based Compute‐In‐Memory Module for Deep Neural Network Training
Wu, Yuting, Wang, Qiwen, Wang, Ziyu, Wang, Xinxin, Ayyagari, Buvna, Krishnan, Siddarth, Chudzik, Michael, Lu, Wei D.
Published in Advanced materials (Weinheim) (01.11.2023)
Published in Advanced materials (Weinheim) (01.11.2023)
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Journal Article
Surface Treatment and Functionalization Effects on Chemical Vapor Deposition and Atomic Layer Deposition Grown HfO2
Consiglio, Steven, Mo, Renee, Tai, Tsong-Lin, Krishnan, Siddarth, O'Meara, David, Wajda, Cory, Chudzik, Michael
Published in ECS transactions (27.04.2007)
Published in ECS transactions (27.04.2007)
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Journal Article
Modeling of SiC transistor with counter-doped channel
Vyas, Pratik B., Pal, Ashish, Weeks, Stephen, Holt, Joshua, Srivastava, Aseem K., Megalini, Ludovico, Krishnan, Siddarth, Chudzik, Michael, Bazizi, El Mehdi, Ayyagari-Sangamalli, Buvna
Published in Solid-state electronics (01.02.2023)
Published in Solid-state electronics (01.02.2023)
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Journal Article
Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
Bao, Ruqiang, Hung, Steven, Wang, Miaomiao, Chung, Kisup, Barman, Soumendra, Krishnan, Siddarth A, Yang, Yixiong, Tang, Wei, Li, Luping, Lin, Yongjing, Chan, Michael S, Chen, Zhebo, Miao, Xin, Hopstaken, Marinus, Conti, Richard A, Jagannathan, Hemanth, Chudzik, Michael P, McHerron, Dalea, Haran, Bala S, Natarajan, Sanjay
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
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Conference Proceeding
Challenges of nickel silicidation in CMOS technologies
Breil, Nicolas, Lavoie, Christian, Ozcan, Ahmet, Baumann, Frieder, Klymko, Nancy, Nummy, Karen, Sun, Bing, Jordan-Sweet, Jean, Yu, Jian, Zhu, Frank, Narasimha, Shreesh, Chudzik, Michael
Published in Microelectronic engineering (02.04.2015)
Published in Microelectronic engineering (02.04.2015)
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Journal Article
Comparative Analysis of Semiconductor Device Architectures for 5-nm Node and Beyond
Peijie Feng, Seung-Chul Song, Nallapati, Giri, Zhu, John, Bao, Jerry, Moroz, Victor, Munkang Choi, Xi-Wei Lin, Qiang Lu, Colombeau, Benjamin, Breil, Nicolas, Chudzik, Michael, Chidambaram, Chidi
Published in IEEE electron device letters (01.12.2017)
Published in IEEE electron device letters (01.12.2017)
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Journal Article
An 8-bit 20.7 TOPS/W Multi-Level Cell ReRAM-based Compute Engine
Correll, Justin M., Jie, Lu, Song, Seungheun, Lee, Seungjong, Zhu, Junkang, Tang, Wei, Wormald, Luke, Erhardt, Jack, Breil, Nicolas, Quon, Roger, Kamalanathan, Deepak, Krishnan, Siddarth, Chudzik, Michael, Zhang, Zhengya, Lu, Wei D., Flynn, Michael P.
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
Published in 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (12.06.2022)
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Conference Proceeding
FINFET HORIZONTAL GATE ALL AROUND AND FINFET DEVICE ISOLATION
YOSHIDA NAOMI, PENA VANESSA, KIM NAMSUNG, WOOD BINGXI, SANCHEZ ERROL ANTONIO C, SUN SHIYU, CHUDZIK MICHAEL, GUARINI THERESA KRAMER, JUN SUNG WON, COLOMBEAU BENJAMIN
Year of Publication 10.06.2024
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Year of Publication 10.06.2024
Patent
Transmission electron microscopy investigation of texture development in magnesium oxide buffer layers
Koritala, R.E., Chudzik, M.P., Zhiping Luo, Miller, D.J., Kannewurf, C.R., Balachandran, U.
Published in IEEE transactions on applied superconductivity (01.03.2001)
Published in IEEE transactions on applied superconductivity (01.03.2001)
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Journal Article
Conference Proceeding
FINFET HORIZONTAL GATE ALL AROUND AND FINFET DEVICE ISOLATION
YOSHIDA NAOMI, PENA VANESSA, KIM NAMSUNG, WOOD BINGXI, SANCHEZ ERROL ANTONIO C, SUN SHIYU, CHUDZIK MICHAEL, GUARINI THERESA KRAMER, JUN SUNG WON, COLOMBEAU BENJAMIN
Year of Publication 20.03.2023
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Year of Publication 20.03.2023
Patent