Resistivity Impact from Modulated Line-Edge-Roughness with Self-aligned Double Patterning
Xu, Dewei, Chuang, KuangChung, Zhao, Wayne, Donegan, Keith, Kook, Seung-Yeop, Augur, Rod, Robert, Fox, Chee, Jeffery
Published in 2020 IEEE International Interconnect Technology Conference (IITC) (05.10.2020)
Published in 2020 IEEE International Interconnect Technology Conference (IITC) (05.10.2020)
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