OXIME ESTER COMPOUND HAVING EXCELLENT HEAT-RESISTANT STABILITY, PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION
CHO, Sung Yong, JU, Jung Jae, PARK, Jae Seok, KIM, Chul Bae, CHOI, Tae Beom, PAE, You Lee, CHUNG, Min Kyung
Year of Publication 30.03.2017
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Year of Publication 30.03.2017
Patent
OXIME ESTER COMPOUND HAVING EXCELLENT HEAT-RESISTANT STABILITY, PHOTOPOLYMERIZATION INITIATOR CONTAINING SAME, AND PHOTOSENSITIVE RESIN COMPOSITION
CHUNG MIN KYUNG, JU JUNG JAE, PAE YOU LEE, PARK JAE SEOK, CHO SUNG YONG, CHOI TAE BEOM, KIM CHUL BAE
Year of Publication 17.07.2018
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Year of Publication 17.07.2018
Patent
Oxime ester compound having improved heat stability and photopolymerization initiator and photoresist composition comprising the same being suitable for application as a photoinitiator for a high-brightness raw material and a transparent material
CHO, SUNG-YONG, PAE, YOU-LEE, PARK, JAE-SEOK, JU, JUNG-JAE, CHOI, TAE-BEOM, CHUNG, MIN-KYUNG, KIM, CHUL-BAE
Year of Publication 16.05.2018
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Year of Publication 16.05.2018
Patent