Deposition of aluminum oxide by evaporative coating at atmospheric pressure (ECAP)
Wu, Yui Lun, Hong, Jungmi, Peterson, David, Zhou, Jeffrey, Cho, Tae S., Ruzic, D.N.
Published in Surface & coatings technology (25.12.2013)
Published in Surface & coatings technology (25.12.2013)
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Journal Article
Conference Proceeding
Optimization of hollow cathode discharge electrode for damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S., Han, Qing, Yang, Dongqing, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar
Published in Japanese Journal of Applied Physics (01.05.2016)
Published in Japanese Journal of Applied Physics (01.05.2016)
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Journal Article
Self-discharge synchronizing operations in the external electrode fluorescent multi-lamps backlight
Cho, Guangsup, Kwon, Nam O, Kim, Young M, Kim, Sung J, Cho, Tae S, Kim, Bong S, Kang, June G, Choi, Eun H, Lee, Ung W, Yang, Soon C, Uhm, Han S
Published in Journal of physics. D, Applied physics (21.10.2003)
Published in Journal of physics. D, Applied physics (21.10.2003)
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Journal Article
Effects of Electrode Length on Capacitively Coupled External Electrode Fluorescent Lamps
Cho, Tae S., Kim, Young M., Kwon, Nam O., Kim, Sung J., Kang, June G., Choi, Eun H., Cho, Guangsup
Published in Japanese Journal of Applied Physics (15.03.2002)
Published in Japanese Journal of Applied Physics (15.03.2002)
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Journal Article
Dual Discharge Modes Operation of an Argon Plasma Generated by Commercial Electronic Ballast for Remote Plasma Removal Process
Cho, Tae S., Yi-Heng Sen, Bokka, Ramesh, Park, Soonam, Lubomirsky, Dima, Venkataraman, Shankar
Published in IEEE transactions on plasma science (01.06.2014)
Published in IEEE transactions on plasma science (01.06.2014)
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Journal Article
Capacitive coupled electrodeless discharge backlight driven by square pulses
Cho, T.S., Kwon, N.O., Kim, Y.M., Kim, H.S., Kim, S.J., Kang, J.G., Choi, E.H., Guangsup Cho
Published in IEEE transactions on plasma science (01.10.2002)
Published in IEEE transactions on plasma science (01.10.2002)
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Journal Article
Dual plasma modes operation of hollow cathode electrode system for remote plasma removals for semiconductor manufacturing
Cho, Tae S., Soonam Park, Lubomirsky, Dima, Venkataraman, Shankar
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
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Conference Proceeding
Influence of driving method on discharge mode of damage free remote plasma removal process for semiconductor manufacturing
Cho, Tae S., Qing Han, Soonam Park, Lubomirsky, Dima, Venkataraman, Shankar
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
Published in 2016 IEEE International Conference on Plasma Science (ICOPS) (01.06.2016)
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Conference Proceeding
Electrical and optical characteristics of cylindrical non-thermal atmospheric-pressure dielectric barrier discharge plasma sources: Atmospheric Pressure Plasma
YUI LUN WU, JUNGMI HONG, ZIHAO OUYANG, CHO, Tae S, RUZIC, D. N
Published in Surface & coatings technology (2013)
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Published in Surface & coatings technology (2013)
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